Dry ice cleaning method for apparatus of coating by vaporization

Abstract

The cleaning with solid carbon dioxide for deposition equipment utilizes the temperature tolerance dramatic change of two materials resulted from the residue heat and solid carbon dioxide after heating the deposition under 100-200DEG C temperature, spraying solid carbon dioxide on the equipment surface, crushing the magnesia film left with solid carbon dioxide staying in the gaps between films left, condensing the contamination, and peeling off the residue film from the equipment with extreme inflation of the solid carbon dioxide. It features in the high voltage withstanding ability of 30,000-40,000 watts, without conductivity, with reduced washing cost of 3-5 times.

Description

technical field

[0001] The invention relates to a cleaning method for evaporation equipment, in particular to a cleaning method for evaporation equipment using dry ice. Background technique

[0002] After the evaporation equipment is used for a certain period of time, a certain thickness of film will accumulate on the surface of the equipment. The existence of these residual films will have a certain impact on the operation rate and quality of the equipment, so the choice of cleaning method for the evaporation equipment is also very important. The essential.

[0003] For the manual knocking method, the operator must first wear professional dust-proof clothing and hold a sharp tool to beat the film thickness on the equipment to make the residual film peel off. Due to the unevenness of the film thickness, after the thick film is cleaned, often There is nothing to do with the thinner residual film, which will still affect the quality of the product. In addition, hitting the e...