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Adjustment assembly and substrate exposure system comprising such an adjustment assembly

a technology of adjustment assembly and substrate, which is applied in the direction of photomechanical equipment, instruments, printing, etc., can solve the problems of affecting the effect of vibration on the substrate exposure, and affecting the performance of the system, so as to reduce the size of the system, increase throughput, and efficiently use the space available

Active Publication Date: 2022-02-01
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The hydraulic system enables precise and remote adjustment of components, effectively compensating for positional deviations and vibrations, while maintaining a stiff support and avoiding electrical interference, thus improving the performance and accuracy of substrate exposure systems.

Problems solved by technology

A disadvantage of this known system is that in use and over time, creep can occur inter alia in the spring element, which results in a deviation of the position of the support element with respect to the support frame from the set position.
This has an adverse effect on the performance of the system, specifically on the exposure of targets.
A disadvantage of this known system is that the actuators which move the exposure apparatus are included as contactless motors and are thus limited in the load that can be carried.
A further problem associated with substrate exposure systems is the negative influence of vibrations on substrate exposure.
A further disadvantage of substrate exposure systems in general, and lithography or microscopy systems in particular, is that they are highly complex systems in which a large number of components are arranged in a compact and / or enclosed configuration.
In such systems it is difficult to adjust the position of a component, in particular when the component is not readily reachable from the outside of the system.

Method used

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  • Adjustment assembly and substrate exposure system comprising such an adjustment assembly
  • Adjustment assembly and substrate exposure system comprising such an adjustment assembly
  • Adjustment assembly and substrate exposure system comprising such an adjustment assembly

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first embodiment

[0082]FIG. 1 schematically shows a substrate exposure system 1 according to the present invention. The vertical direction corresponds to the Z-direction, whereas the horizontal direction corresponds to the Y-direction. The X-direction is perpendicular to both the Y-direction and the Z-direction and extends into and out of the paper.

[0083]The substrate exposure system 1 comprises a frame 2, a substrate support module 3 for carrying a substrate 5, and an exposure apparatus 4 for projecting a beam or multiple beams of electromagnetic radiation or charged particles onto a substrate 5, such as a semiconductor wafer.

[0084]The substrate exposure system 1 comprises a housing 11 which substantially encloses the exposure apparatus 4 and the substrate support module 3. When the exposure apparatus 4 is arranged for using UV, deep UV (DUV), extreme UV (EUV), X-ray beams or charged particle beams, the housing 11 is arranged to function as a vacuum chamber, wherein, in use, the housing 11 is coupl...

second embodiment

[0103]FIG. 2 shows a substrate exposure system 1′ according to the present invention. In this embodiment the substrate support module 3 is arranged on top of a third support member 29. Underneath the third support member 29 several first bellows 71′ are arranged, which first bellows 71′ are arranged between the bottom wall 21 of the frame 2′ and the third support member 29. The first bellows 71′ are connected with the second bellows 72′ via conduits 73′ to form an hydraulic system which allows to move the third support member 29 with respect to the bottom wall 21 of the frame 2′.

[0104]The first support member 26 is arranged on top of three support posts 222. The three support posts 222 are arranged at the corner points of a triangle on top of a frame bottom wall 21, and extend in the Z-direction, substantially perpendicular to the frame bottom wall 21. Preferably, the exposure apparatus 4 is arranged substantially at a center point of said triangle formed by the three support posts ...

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Abstract

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

Description

[0001]This application claims the benefits of priority to International Application No. PCT / EP2017 / 082892, filed on Dec. 14, 2017, and published as WO 2018 / 122003 A1; which claims benefits of priority to NL Application No. 2018108, filed on Dec. 30, 2016, and to U.S. application Ser. No. 15 / 396,032, filed on Dec. 30, 2016. These applications are incorporated herein by reference in their entireties.BACKGROUND[0002]The invention relates to a mechanical adjustment assembly and to systems adjusted thereby. In particular a mechanical adjustment assembly for use in systems comprising a series of mechanically interlinked components, in particular systems having components in difficult to approach environments such as but not limited to exposure systems, more in particular systems or mechanical arrangements comprising a frame, a first module connected to said frame, a second module carried by or connected to said frame. The invention further relates to a method for adjusting the position an...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): G03B27/58G03F7/20
CPCG03F7/70775G03F7/708G03F7/70833G03F7/70975H01J37/20H01J37/3174H01J37/3177H01J37/023H01J2237/0216G03F7/70258H01J37/28H01J2237/0245
Inventor PEIJSTER, JERRY JOHANNES MARTINUS
Owner ASML NETHERLANDS BV