System for performing data pattern sensitivity compensation using different voltage

a data pattern and voltage technology, applied in the field of nonvolatile memory, can solve the problems of reducing the available separation between adjacent states, erroneous reading of data stored, and errors when reading non-volatile data, so as to reduce the coupling effect and achieve more accurate storage and retrieval

Active Publication Date: 2007-12-06
SANDISK TECH LLC
View PDF72 Cites 53 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0023]To account for coupling between neighboring floating gates, the read process for a particular memory cell will provide compensation to an adjacent memory cell in order to reduce the coupling effect that the adjacent memory cell has on the particular memory cell. To account for the back pattern effect, a first voltage is used during a verify operation for unselected word lines that have been subjected to a programming operation and a second voltage is used for unselected word lines that have not been subjected to a programming operation. The combination of these two techniques provides for more accurate storage and retrieval of data.

Problems solved by technology

Errors can occur when reading non-volatile storage element due to at least two mechanisms: (1) capacitive coupling between neighboring floating gates and (2) changing conductivity of the channel area after programming (referred to as back pattern effect).
The coupling from adjacent memory cells can shift the apparent charge level being read a sufficient amount to lead to an erroneous reading of the data stored.
As memory cells continue to shrink in size, the natural programming and erase distributions of threshold voltages are expected to increase due to short channel effects, greater oxide thickness / coupling ratio variations and more channel dopant fluctuations, reducing the available separation between adjacent states.
Errors can also occur due to the back pattern effect.
Therefore, the channel area under those word lines was conducting very well, resulting in a relatively high cell current during the actual verify operation.
The lowered current causes an artificial shift of the threshold voltages for the memory cells, which can lead to errors when reading data.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System for performing data pattern sensitivity compensation using different voltage
  • System for performing data pattern sensitivity compensation using different voltage
  • System for performing data pattern sensitivity compensation using different voltage

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0060]One example of a memory system suitable for implementing the present invention uses the NAND flash memory structure, which includes arranging multiple transistors in series between two select gates. The transistors in series and the select gates are referred to as a NAND string. FIG. 1 is a top view showing one NAND string. FIG. 2 is an equivalent circuit thereof The NAND string depicted in FIGS. 1 and 2 includes four transistors, 100, 102, 104 and 106, in series and sandwiched between a first select gate 120 and a second select gate 122. Select gate 120 gates the NAND string connection to bit line 126. Select gate 122 gates the NAND string connection to source line 128. Select gate 120 is controlled by applying the appropriate voltages to control gate 120CG. Select gate 122 is controlled by applying the appropriate voltages to control gate 122CG. Each of the transistors 100, 102, 104 and 106 has a control gate and a floating gate. Transistor 100 has control gate 100CG and flo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Errors can occur when reading the threshold voltage of a programmed non-volatile storage element due to at least two mechanisms: (1) capacitive coupling between neighboring floating gates and (2) changing conductivity of the channel area after programming (referred to as back pattern effect). To account for coupling between neighboring floating gates, the read process for a particular memory cell will provide compensation to an adjacent memory cell in order to reduce the coupling effect that the adjacent memory cell has on the particular memory cell. To account for the back pattern effect, a first voltage is used during a verify operation for unselected word lines that have been subjected to a programming operation and a second voltage is used for unselected word lines that have not been subjected to a programming operation. The combination of these two techniques provides for more accurate storage and retrieval of data.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The following application is cross-referenced and incorporated by reference herein in its entirety:[0002]U.S. patent application Ser. No. 11 / 421,871 [Attorney Docket No. SAND-01103US0], entitled “Data Pattern Sensitivity Compensation Using Different Voltage,” by Nima Mokhlesi and Yingda Dong, filed the same day as the present application.[0003]U.S. patent application Ser. No. 11 / 377,972, entitled “System for Performing Read Operation On Non-volatile Storage with Compensation for Coupling,” by Nima Mokhlesi, filed on Mar. 17, 2006.[0004]U.S. patent application Ser. No. 11 / 384,057, entitled “Read Operation for Non-volatile Storage with Compensation for Coupling,” by Nima Mokhlesi, filed on Mar. 17, 2006.[0005]U.S. patent application Ser. No. 11 / 421,667, entitled “Verify Operation For Non-Volatile Storage Using Different Voltages,” by Gerrit Jan Hemink, filed on Jun. 1, 2006.[0006]U.S. patent application Ser. No. 11 / 421,682, entitled “System...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(United States)
IPC IPC(8): G11C16/04G11C11/34G11C16/06
CPCG11C11/5628G11C11/5642G11C16/0483G11C2211/5621G11C16/3454G11C16/3459G11C16/3418
Inventor MOKHLESI, NIMADONG, YINGDA
Owner SANDISK TECH LLC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products