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Trivalent Chromium Electroplating Solution and an Operational Method Thereof

a technology of trivalent chromium and electroplating solution, applied in the field of trivalent chromium electroplating solution, can solve the problem that hexavalent chromium-based solution is not suitable for application, and achieve the effect of high current efficiency

Inactive Publication Date: 2009-08-27
CHANG GUNG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0005]The main objective of present invention is to provide a trivalent chromium-divalent nickel solution in which a chromium-nickel alloy deposit can be obtained by electroplating at a room temperature with high current efficiency.
[0007]The trivalent chromium-based electroplating solution has low toxicity. The proposed solution can be directly applied to obtain a chromium-nickel alloy deposit on a metallic component by electrodeposition.

Problems solved by technology

Owing to highly toxic in nature and RoHS limitation, the hexavalent chromium-based solution is not suitable to be applied for obtaining chromium and chromium alloy deposits.

Method used

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  • Trivalent Chromium Electroplating Solution and an Operational Method Thereof
  • Trivalent Chromium Electroplating Solution and an Operational Method Thereof
  • Trivalent Chromium Electroplating Solution and an Operational Method Thereof

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Embodiment Construction

[0013]A trivalent chromium-based electroplating solution in accordance with the present invention contains a trivalent chromium salt, a bivalent nickel salt, a complex agent, a conductive salt, a buffering agent and an additive for electroplating a chromium-nickel deposit on a metal component. By using the lowly toxic trivalent chromium ion to substitute highly toxic hexavalent chromium ion, the present trivalent chromium-based electroplating solution has much less pollution and high current efficiency to obtain chromium-nickel deposits with different ratios of chromium and nickel concentrations. Moreover, the electroplating can be conducted at room temperature.

[0014]The trivalent chromium-based solution comprises: 0.1-1.2 mole / L of the trivalent salt that is selected from the group consisting of chromium chloride, chromium sulfate, or a hydrate of each forgoing salts; 0.1-0.8 mole / L of the bivalent salt that is selected from the group consisting of nickel chloride, nickel sulfate, ...

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Abstract

A trivalent chromium-based electroplating solution in accordance with the present invention a trivalent chromium salt, a bivalent nickel salt, a complex agent, a conductive salt, a buffering agent and an additive for electroplating a chromium-nickel alloy deposit on a component. By using the lowly toxic trivalent chromium to substitute highly toxic hexavalent chromium, an electroplating procedure with the present trivalent chromium-based electroplating solution has less pollution and high current efficiency to allow the electroplating performing at the room temperature.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to an electroplating technology. It provides a lowly toxic trivalent-chromium based electroplating solution which is used for obtaining a chromium-nickel alloy deposit on a metal component. The electroplating is conducted with high current efficiency at room temperature. An electroplating procedure is also disclosed in this invention. From the proposed electroplating solution, a leveling and brightening chromium-nickel deposit can be easily achieved. Furthermore, chromium-nickel deposits with different ratios of chromium and nickel concentrations could be obtained by varying electroplating current density. Both decorative and hard chromium-based deposits could be achieved from the proposed trivalent chromium-based electroplating solution.[0003]2. Description of Related Art[0004]The chromium-nickel alloys have been widely used in application owing to its superior mechanical properties and co...

Claims

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Application Information

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IPC IPC(8): C25D3/06
CPCC25D3/06C25D5/18C25D3/56C25D5/627C25D5/611
Inventor HUANG, CHING-ANHSU, CHUN-CHINGCHEN, CHAO-YULIU, YU-WEI
Owner CHANG GUNG UNIVERSITY
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