Double-face heat removal of vertically integrated chip-stacks utilizing combined symmetric silicon carrier fluid cavity and micro-channel cold plate
a silicon carrier fluid cavity and vertical integration technology, applied in the field of electrical and thermal arts, can solve the problems of difficult implementation, limited interlayer cooling, and a possible single chip package similar to conventional single-chip packages, and achieve the effect of making the action easier
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[0016]One or more embodiments of the invention provide double-face stack cooling utilizing the silicon-carrier and a back-side cold plate as heat absorbers, advantageously combining the strength of the mentioned technologies at moderate complexity. Front-side cooling using dielectric fluids pumped through the C4 (Controlled Collapse Chip Connection) ball array has already been proposed. However, limited heat removal capability is attained due to the poor thermo-physical properties of these coolants, especially in low height cavities, resulting in low heat flux capacity. The use of the superior thermal properties of water was not possible due to electro corrosion and shorting between solder balls. With the symmetric silicon-carrier fluid cavity, according to one or more embodiments of the invention, the electrical inputs and outputs (I / Os) are insulated from the coolant, and therefore water can be used. The industry calls these electrical interconnects “through silicon vias” (TSV).
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