Polarization actuator

Abstract

The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams (4) arranged alongside one another, wherein provision is made of at least one optical element (5, 15, 25) which is movable transversely with respect to the light beams and by which the light beams can be influenced if the light beams pass through the optical element, and which has at least one light-absorbing region (9, 19, 29), wherein the apparatus comprises a drive device for the optical element, a measuring device for detecting the light of the light beam and a control unit, wherein the control unit is designed such that the drive device is controlled in a manner dependent on the position of the light-absorbing region. Furthermore, the present invention also relates to a projection exposure apparatus for microlithography comprising a multi-mirror array, in Which the corresponding apparatus can be used, and to a method for operating the corresponding apparatus or the projection exposure apparatus.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams arranged alongside one another, and to a projection exposure apparatus for microlithography comprising a multi-mirror array, which is illuminated by a plurality of light beams. Furthermore, the present invention relates to a method for influencing a light beam arrangement comprising a plurality of light beams arranged alongside one another, more particularly influencing with regard to changing the polarization direction.[0003]2. Prior Art[0004]Projection exposure apparatuses for microlithography are used for producing structures having extremely small dimensions in microelectronics or in nanotechnology. Accordingly, it is necessary that structures can be imaged with extremely high accuracy. For this purpose, actuators often have to be used in projection exposure apparatuses for microlithography in...

AI Technical Summary

Benefits of technology

[0007]Therefore, the problem addressed by the present invention is that of providing a simple possibility for the positioning and arrangement of optical elements in a projection exposure apparatus for microlithography and, more particularly, for the arrangement of an optical element for influencing a light beam arrangement comprising a plurality of light beams arranged alongside one another.Technical Solution

[0009]The invention is based on the assumption that simple and at the same time exact positioning of an optical element for influencing a light beam arrangement comprising a plurality of light beams arranged alongside one another can be achieved by virtue of the fact that a measuring device detects a change in intensity by virtue of a light-absorbing region arranged at the optical element, and the arrangement of the optical element can be controlled in this way.

[0012]In this case, the light-absorbing regions can be arranged at the same location in each case at the individual optical elements or they can differ in their position such that an overlap of the light-absorbing regions in the beam direction of the light beams does not occur in any position of the optical elements, that is to say that an overlap of the light-absorbing regions in the beam direction of the light beams is avoided in the case of any combination of the possibilities for the arrangement of the optical elements in the beam path, A simple identification of the position of the individual optical elements is possible as a result.

[0015]Accordingly, the apparatus according to the invention can be used, more particularly, in a projection exposure apparatus for microlithography comprising a multi-mirror array, which is illuminated by a plurality of light beams arranged alongside one another, wherein, in a pupil plane of the projection exposure apparatus, exactly one region in each case can be assigned to a plurality of light beams. More particularly, corresponding regions in a. pupil plane can be assigned to the light beams which are intended to be influenced. Consequently, in the pupil plane provision can be made of a measuring device for measuring the light intensity, as is provided. according to the invention in the apparatus for influencing a light beam arrangement. More particularly, it is also possible to use a measuring device which is already used for other purposes in the region of the pupil plane of a projection exposure apparatus. in this way, the outlay for the exact positioning of the polarizers in an illumination unit of a projection exposure apparatus can be reduced further.

Problems solved by technology

Since the exact positioning of corresponding components in optical apparatuses described above causes a high complexity and thus high costs, there is a need to seek simple solutions for this purpose.

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