Method for manufacturing a narrow magnetic read width current perpendicular to plane magnetoresistive sensor

Abstract

A method for manufacturing a magnetic read head having a very narrow track width. The method includes the use of a non-Si containing photoresist to form a mask prior to ion milling to define the track-width of the sensor. Previously only Si-containing resists were used. The Si in the resist turned to an oxide, which allowed the photoresist to withstand the reactive ion etching used for image transfer to an underlying hard mask. The Si-containing resist, however, has limitations as to how small the mask can be made. It has been found that a non-Si-containing resist provides better resolution at very narrow track-width definition, and also provides good temperature resistance. Some modifications to the process allow the non-Si-containing resist to be used in the construction of the magnetic read sensor.

Description

FIELD OF THE INVENTION[0001]The present invention relates to magnetoresistive sensors and more particularly to a sensor manufactured by a process that allows the sensor to be formed with a very small magnetic read width.BACKGROUND OF THE INVENTION[0002]The heart of a computer is an assembly that is referred to as a magnetic disk drive. The magnetic disk drive includes a rotating magnetic disk, write and read heads that are suspended by a suspension arm adjacent to a surface of the rotating magnetic disk and an actuator that swings the suspension arm to place the read and write heads over selected circular tracks on the rotating disk. The read and write heads are directly located on a slider that has an air bearing surface (ABS). The suspension arm biases the slider into contact with the surface of the disk when the disk is not rotating, but when the disk rotates air is swirled by the rotating disk. When the slider rides on the air bearing, the write and read heads are employed for w...

AI Technical Summary

Benefits of technology

The present invention provides a method for manufacturing a magnetic read head with a very narrow track width. The method includes depositing a plurality of sensor layers, depositing a non-Si-containing photoresist, patterning the photoresist and performing an ion milling to define the magnetic read head. The use of the non-Si-containing photoresist allows for better resolution and improved depth of focus compared to previously used Si-containing photoresist. Certain manufacturing process changes make possible the use of the non-Si-containing resist, such as the use of a Si containing Bottom Anti-reflective Coating and adding a noble gas to the reactive ion etching chemistry. The invention has technical effects such as improved sensor width and better RIE selectivity during the image transfer process.

Problems solved by technology

A glancing ion milling assisted CMP liftoff process can also be useful in removing the remaining mask layers at very small sensor widths, which may not be possible using CMP alone.

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