Etching Gas
Inactive Publication Date: 2012-09-13
CENT GLASS CO LTD
5 Cites 10 Cited by
AI-Extracted Technical Summary
Problems solved by technology
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreBenefits of technology
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreAbstract
Disclosed is an etching gas provided containing CHF2COF. The etching gas may contain, as an additive, at least one kind of gas selected from O2, O3, CO, CO2, F2, NF3, Cl2, Br2, I2, XFn (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≦n≦7.), CH4, CH3F, CH2F2, CHF3, N2, He, Ar, Ne, Kr and the like, from CH4, C2H2,C2H4,C2H6, C3H4, C3H6, C3H5, HI, HBr, HCl, CO, NO, NH3, H2 and the like, or from CH4, CH3F, CH2F2 and CHF3. This etching gas is not only excellent in etching performances such as the selection ratio to a resist and the patterning profile but also easily available and does not substantially by-produce CF4 that places a burden on the environment.
Application Domain
Technology Topic
Image
Examples
- Experimental program(1)
Example
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Property | Measurement | Unit |
Fraction | 0.0011 | fraction |
Fraction | 0.0018 | fraction |
Time | 243480.0 | s |
tensile | MPa | |
Particle size | Pa | |
strength | 10 |
Description & Claims & Application Information
We can also present the details of the Description, Claims and Application information to help users get a comprehensive understanding of the technical details of the patent, such as background art, summary of invention, brief description of drawings, description of embodiments, and other original content. On the other hand, users can also determine the specific scope of protection of the technology through the list of claims; as well as understand the changes in the life cycle of the technology with the presentation of the patent timeline. Login to view more.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Similar technology patents
Resin plating method
ActiveUS20170159183A1Inhibit reduction of etch powerExcellent etch performanceLiquid/solution decomposition chemical coatingContinuous useChemistry
Owner:OKUNO CHEM IND CO LTD
Battery pack
ActiveUS20190109354A1Easily availableEasy to handleNon-macromolecular adhesive additivesSecondary cellsElectrical batteryEngineering
Owner:TOYOTA JIDOSHA KK
Agent for Alleviating Vascular Failure
Owner:FUJI CHEM IND CO LTD +1
Reinforcement tape and an assembly of the reinforcement tape and a substrate
InactiveUS20180281346A1High strengthEasily availableLamination ancillary operationsCovering/liningsEngineeringMechanical engineering
Owner:JOE GREEN PTE LTD
Heat-sealable laminate and method for producing same
ActiveUS20120189790A1Good economyEasily availableSynthetic resin layered productsPretreated surfacesPaper sheetPaper based
Owner:NISSIN FOODS HLDG CO LTD
Classification and recommendation of technical efficacy words
- Excellent etch performance
- Easily available
Resin plating method
ActiveUS20170159183A1Inhibit reduction of etch powerExcellent etch performanceLiquid/solution decomposition chemical coatingContinuous useChemistry
Owner:OKUNO CHEM IND CO LTD