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Carbon wire and NANO structure formed of carbon film and method of producing the same

a carbon film and nano-structure technology, applied in the direction of sustainable manufacturing/processing, final product manufacturing, natural mineral layered products, etc., can solve the problems of high contact resistance, use these methods, and inability to provide a large area of graphite film essential to device application, etc., to achieve low resistance, low resistance carbon wire, low resistance

Inactive Publication Date: 2013-08-29
SUMITOMO ELECTRIC IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention is about a method to make a low resistance carbon wire and wire assembly, as well as a low resistance electrically conductive film with a carbon nanotube network. This method can also be used to produce a transparent, electrically conductive sheet. The carbon nanotubes allow for efficient light transmission, and the method is suitable for large-scale production. The invention can be used for various electronic devices and displays. Overall, the technical effects of this patent are to achieve low resistance in carbon wires and wires, and to provide a transparent, electrically conductive sheet with a carbon nanotube network.

Problems solved by technology

However, the thin film of carbon nanotubes has the carbon nanotubes interconnected simply by contacting one another, and is thus disadvantageously high in contact resistance.
It is difficult, however, to use these methods to handle general, industrial production, and furthermore, the methods cannot provide a large area of graphite film essential to device application.

Method used

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  • Carbon wire and NANO structure formed of carbon film and method of producing the same
  • Carbon wire and NANO structure formed of carbon film and method of producing the same
  • Carbon wire and NANO structure formed of carbon film and method of producing the same

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first embodiment

[0157]FIG. 10 is a schematic cross section of one example of a graphite film production apparatus used in the present invention.

[0158](Graphite Film Production Apparatus)

[0159]The present invention employs a graphite film production apparatus configured of quartz reaction tube 6 and alumina container 20 provided in quartz reaction tube 6 and having liquid Ga 1 introduced therein. Substrate 17 with amorphous carbon film 21 provided thereon is to be processed, placed in a vicinity of alumina container 20. External to quartz reaction tube 6, heater 7 is provided for the reaction tube to regulate the internal temperature of quartz reaction tube 6.

[0160]Substrate 17 may be a conventionally well known substrate that is used as a substrate for production of electrically conductive film. Preferably, an SiC, Ni, Fe, Mo, Pt or similar, monocrystalline substrate is used, as monocrystalline graphite film can be obtained.

[0161]Amorphous carbon film 21 may be provided in any conventional well kno...

second embodiment

[0167](Graphite Film Production Apparatus)

[0168]FIG. 11 is a schematic cross section of one example of a graphite film production apparatus used in the present invention when Ga vapor has uniform vapor pressure at a surface of a carbon source. A second embodiment employs a graphite film production apparatus having quartz reaction tube 6 and a subordinate Ga reaction chamber 22 provided in quartz reaction tube 6 and accommodating alumina container 20 having liquid Ga 9 introduced therein, and substrate 17 having amorphous carbon film 21 thereon, i.e., a substrate to be processed. Subordinate Ga reaction chamber 22 has a wall having a differential evacuation in the form of a small gap.

[0169]The first embodiment shows a graphite film production apparatus having quartz reaction tube 6 internally filled with Ga vapor 5 generated from liquid Ga 9. However, while a portion of quartz reaction tube 6 that is close to heater 7 is maintained at a predetermined high temperature, portions of qua...

third embodiment

[0175](Graphite Film Production Apparatus)

[0176]FIG. 12 is a schematic cross section of one example of a graphite film production apparatus employed in the present invention with Ga vapor plasmatized. A third embodiment employs a graphite film production apparatus having quartz reaction tube 6 accommodating alumina container 20 having liquid Ga 9 introduced therein, and a plasma producing electrode 10, with a heater 12 provided at the alumina container for Ga. Substrate 17 with amorphous carbon film 21 thereon, or a substrate to be processed, is positioned in a vicinity of alumina container 20 between paired plasma producing electrodes 10 and exposed to a Ga plasma 23. External to quartz reaction tube 6, heater 7 is provided for the reaction tube to regulate the internal temperature of quartz reaction tube 6.

[0177]Using Ga vapor to obtain graphite film is an effective technique to obtain a single or multiple layers of large-area graphite film and is a practical technique directed to...

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Abstract

There are provided a carbon wire using CNT or a similar carbon filament having a sufficiently low electrical resistance value, and a wire assembly employing that carbon wire. A carbon wire (1) includes an assembly portion (3) and a graphite layer (4). The assembly portion (3) is configured of a plurality of carbon filaments implemented as carbon nanotubes (2) in contact with one another. The graphite layer (4) is provided at an outer circumference of the assembly portion (3).

Description

TECHNICAL FIELD[0001]The present invention relates generally to carbon wires, wire assemblies and methods of producing the same, and particularly to carbon wires, wire assemblies and methods of producing the same, that employ a plurality of carbon filaments.[0002]The present invention also relates to electrically conductive film, electrically conductive substrates, and transparent, electrically conductive sheet including graphite film, that are obtained by exposing a carbon nanotube network to Ga vapor, and methods of producing the same.[0003]The present invention also relates to methods of obtaining graphite film by exposing a carbon source to Ga vapor.BACKGROUND ART[0004]As one example of a carbon filament, a carbon nanotube (CNT) has excellent properties and is accordingly expected to be employed in a variety of industrial applications. For example, a CNT provides substantially as low an electrical resistance value as copper and is thus considered to be used as a material for wir...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01B13/00H01B1/04H10K99/00
CPCB82Y10/00Y10S977/932B82Y40/00C01B31/0226C01B2202/34C01B2202/36H01B1/24H01L51/0021H01L51/0048H01L51/102H01L51/444H01L51/5203H01B1/04H01B13/0036Y10S977/89B82Y30/00C01B32/16Y02E10/549Y02P70/50H10K71/60H10K85/221H10K30/821H10K10/82H10K50/805
Inventor HIKATA, TAKESHIFUJITA, JUN-ICHI
Owner SUMITOMO ELECTRIC IND LTD
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