Apparatus and method for generating a layer system

Abstract

For improving the variability in the coating of substrates a coating apparatus is proposed having a plasma generator for generating a plasma jet which exits from a coating head of the plasma generator. A first particle reservoir and a second particle reservoir are provided. The particles from the first particle reservoir and the second particle reservoir are supplied to the plasma jet as a particle mixture via a transport pipe. A supply control device is provided for setting the amount of particles from the first particle reservoir fed into the transport pipe relative to the amount of particles from the second particle reservoir.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application claims priority from German Patent Application No. 10 2012 108 919.1, filed on Sep. 21, 2012, which application is incorporated herein by reference in its entirety.FIELD OF THE INVENTION[0002]The invention relates to a coating apparatus for coating a substrate with a plasma generator.[0003]Furthermore the invention relates to a method for coating a.BACKGROUND OF THE INVENTION[0004]The complex requirements of modern engineering and material challenges implies, to a growing extent, the use of material combinations, amongst them compound materials and layered systems. Such layered systems may for example be used as protective or functional layers on objects against corrosive, thermal, chemical, or biological stresses in many ways. For making such material or layer compounds currently various technologies are employed. Therein often chemical vapor deposition (CVD) or physical vapor deposition (PVD) are used, Further establish...

AI Technical Summary

Benefits of technology

[0022]A coating apparatus for coating a substrate is proposed. The coating apparatus comprises a plasma generator for generating a plasma jet, wherein the plasma jet exits from a coating head of the plasma generator. Particles from a first particle reservoir can be supplied to the plasma jet via a transport pipe. A second particle reservoir is provided from which particles can also be supplied via the transport pipe to the plasma jet. A supply control device in the transport pipe allows setting the amount of particles from the first particle reservoir relative to the amount of particles from the second particle reservoir. Advantageously this ratio of amounts of particles can be varied even during the coating process. This also makes possible the generation of a changing layer profile on the surface of the substrate.

Problems solved by technology

These known techniques have method specific limitations, however.

Unfavorable layer properties like for example open porosity and cracks in the layer reduce the protective effect against reactive media.

Therefore often laborious additional processes are required.

A disadvantage of this method of applying layers to substrates is that the property of the layer to be applied is fixed in the process.

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