Pattern formation method, lithography apparatus, lithography system, and article manufacturing method

Abstract

A pattern forming method includes: a first step of forming a first pattern to define a first shot arrangement; and a second step of performing an imprint process, thereby forming a second pattern on the imprint material on the first pattern and defining a second shot arrangement. In the second step, the second shot arrangement is defined so as to reduce an overlay error between the first and second shot arrangements by deforming the mold. In the first step, based on information of the estimated second shot arrangement definable on the substrate when the second step is performed after the second pattern formed on the mold is amended by deforming the mold, the first pattern is formed to make an overlay error between the first and second shot arrangements fall within an allowable range.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a pattern formation method, a lithography apparatus, a lithography system, and an article manufacturing method.[0003]2. Description of the Related Art[0004]An imprint technique is a technique capable of transferring a nanoscale micropattern, and is coming into practical use as one lithography technique for mass production of magnetic storage media and semiconductor devices. In the imprint technique, a micropattern is formed on a substrate such as a silicon substrate or glass plate by using, as an original, a mold on which a micropattern is formed using an electron beam drawing apparatus or the like. This micropattern is formed as follows. A resin is applied onto a substrate. While the mold pattern is pressed against the substrate via the resin, the substrate is irradiated with ultraviolet rays, thereby curing the resin. Then, the mold is released from the cured resin. Such an imprint tec...

AI Technical Summary

Benefits of technology

The present invention is about a way to make patterns that are more accurate. It uses an imprint process to make sure that things are aligned correctly when a new layer is put on top. This makes it easier to create things like lenses or sensors that have very precise properties.

Problems solved by technology

However, it is difficult for the imprint apparatus to greatly correct the pattern shape of a mold by the mold correction mechanism.

Correction methods executable by the imprint apparatus are limited.

Especially when the imprint process is performed at once in a plurality of shot regions or shot regions on the entire surface of a substrate, correction is difficult for the methods disclosed in Japanese Patent Laid-Open No. 2008-504141 and International Publication No. 99 / 36949 because the shapes of patterns formed in respective shot regions are different.

As a result, the overlay accuracy may drop.

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