Silver halide photographic light-sensitive material
a technology of silver halide and light-sensitive materials, applied in the field of high-sensitivity silver halide photographic light-sensitive materials, can solve the problems of insufficient sensitivity level of these methods, the amount of sensitizing dye adsorption to the surface of silver halide grains is limited, and the saturation adsorption of dye chromophore cannot be exceeded by a single layer
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example 1
Preparation of Silver Bromide Octahedral Emulsion (Emulsion A) and Silver Bromide Tabular Emulsions (Emulsion B and Emulsion C)
[0505]To a reactor, 1,000 ml of water, 25 g of deionized ossein gelatin, 15 ml of an aqueous 50% NH4NO3 solution and 7.5 ml of an aqueous 25% NH3 solution were added. The mixture was kept at 50° C. and thoroughly stirred and thereto, 750 mL of an aqueous 1N silver nitrate solution and 1 mol / liter of an aqueous potassium bromide solution were added over 50 minutes. During the reaction, the silver potential was kept at −40 mV. The silver bromide grain obtained was octahedral and had an equivalent-sphere diameter of 0.846±0.036 μm. The temperature of the obtained emulsion was lowered and the emulsion was desalted by ultrafiltration. Subsequently, 95 g of deionized ossein gelatin and 430 ml of water were added to adjust the pH and the pAg at 50° C. to 6.5 and 8.3, respectively. After adding potassium thiocyanate, chloroauric acid and sodium thiosulfate to give o...
example 2
[0547]The same comparison as in Example 1 was performed for the color negative light-sensitive system in Example 1 of JP-A-11-305369, for the color reversal light-sensitive material systems in Example 1 of JP-A-7-92601 and JP-A-11-160828, for the color paper light-sensitive material system in Example 1 of JP-A-6-347944, for the instant light-sensitive material system in Example 1 of JP-A-2000-284442, for the light-sensitive material system for printing in Example 1 of JP-A-8-292512, for the X-ray light-sensitive material system in Example 1 of JP-A-8-122954, and for the heat-developable light-sensitive material systems in Example 5 of JP-A-2000-122206, Example 1 of JP-A-2001-281785 (Japanese Patent Application No. 2000-89436) and Example 1 of JP-A-6-130607. As a result, the same effects as in Example 1 were exhibited.
[0548]According to the present invention, a high-sensitivity silver halide photographic light-sensitive material can be obtained.
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