Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device

Abstract

A method of manufacturing an active matrix substrate is provided that uses a technique of transferring a thin film device. In forming thin film transistors and pixel electrodes on an original substrate before transfer, an insulator film such as an interlayer insulation film or the like, is previously removed before the pixel electrodes are formed. Further, the original substrate is separated by exfoliation to transfer the device to a transfer material to cause the pixel electrodes to partially appear in the surface or the vicinity of the surface of the device. This portion permits application of a voltage to a liquid crystal through the pixel electrode.

Description

[0001]This is one of two (2) reissue applications directed to various aspects of manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device described in U.S. Pat. No. 6,127,199. The first reissue application is application Ser. No. 10 / 263,070, filed Oct. 3, 2002. The second reissue application is the present application, which is a Divisional of application Ser. No. 10 / 263,070. As noted above, this is a Divisional of application Ser. No. 10 / 263,070, filed Oct. 3, 2002 now Re. 38,466 which is a reissue of U.S. Pat. No. 6,127,199, which corresponds to U.S. patent application Ser. No. 09 / 113,373 filed Jul. 10, 1998, which is a Continuation-In-Part of Application No. PCT / JP97 / 04110 filed Nov. 11, 1997.<?insert-end id="INS-S-00001" ?>CROSS-REFERENCE TO RELATED APPLICATIONS[0002]This application is a continuation-in-Part of international application PCT / JP97 / 04110, filed on Nov. 11, 1997, which claims priority from Japanese application...

AI Technical Summary

Benefits of technology

[0012]The present invention has been achieved in consideration of these problems, and an object of the invention is to provide a novel technique which permits independent free selection of a substrate used in producing thin film devices, and a substrate (a substrate having preferable properties for application of a product) used in, for example, actual use of a product, and a completely new method of effectively manufacturing an active matrix substrate having excellent properties and a liquid crystal display device by using the technique.

[0037]This invention is different from invention (1) in that the intermediate layer is provided. The intermediate layer can comprise a single layer film of an insulator, such as an SiO2 film or the like, or a multilayered film comprising a laminate of an insulator and a metal. The intermediate layer functions to facilitate separation from the separation layer, protect the transistors from contamination during removal of the separation layer, ensure insulation properties of the transistors, and suppress irradiation of the transistors with laser light.

[0038]In forming the thin film transistors and the pixel electrodes on the original substrate before transfer, at least a portion of the insulator layer such as an interlayer insulation film or the like, which causes a problem in the later steps, is removed before the pixel electrodes are formed. In this case, the whole insulation film and intermediate layer below it are preferably removed at the same time from the viewpoint of prevention of a loss of the voltage applied to the liquid crystal. However, where the insulator layer remaining unremoved is thin, a sufficient voltage can be applied to the liquid crystal from the pixel electrodes. Therefore, at least a portion of the insulation film may be removed.

[0071](12) This invention provides an active matrix substrate manufactured by the method of manufacturing an active matrix substrate of any one of inventions (1) to (11). Since limitations due to the manufacturing conditions are eliminated so that the substrate can freely be selected, a novel active matrix substrate, which has not yet been realized, can be realized.(13) This invention provides a liquid crystal display device comprising an active matrix substrate manufactured by the method of manufacturing an active matrix substrate of any one of inventions (1) to (11). For example, it is possible to realize an active matrix type liquid crystal display device comprising a plastic substrate and having flexibility.

Problems solved by technology

If the insulation film has a large thickness, a large voltage loss occurs in this portion, and thus a sufficient voltage cannot be applied to a liquid crystal.

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