The invention relates to a compound for forming a
metal-containing film, a composition for forming a
metal-containing film, and a pattern forming method. The present invention addresses the problem of providing: a
metal-containing film-forming compound for forming a metal-containing film that contributes to sensitivity improvement while maintaining the LWR of an upper layer
resist; a metal-containing film-forming composition; and a pattern-forming method using the metal-containing film-forming composition. [Solution] A compound for forming a metal-containing film, which contains at least one metal atom (a) selected from the group consisting of Ti, Zr, and Hf, and a polydentate ligand coordinated to the metal atom (a), and wherein the polydentate ligand is substituted with a
fluorine atom and has a structure represented by general formula (1) or a structure represented by general formula (2). And is derived from a compound (b) having 1-50 carbon atoms and containing one or more crosslinkable groups selected from the group consisting of a vinyl group, an allyl group, an allyloxy group, an ethynyl group, a
propargyl group, a
propargyl group, an
epoxy group, an oxetanyl group, a
nitrile group, and a
vinylidene group.