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Tool for handling wafers and epitaxial growth station

A technology of epitaxial growth and wafers, which is applied in the directions of crystal growth, conveyor objects, transportation and packaging, etc., and can solve problems such as bad deformation of wafers

Inactive Publication Date: 2007-11-14
LPE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] If the solution only considers closing the very large central hole, there will be no atmospheric pumping, but there is a risk that pumping will cause undesirable deformation of the wafer held by the tool; This risk will be greater during removal of the

Method used

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  • Tool for handling wafers and epitaxial growth station
  • Tool for handling wafers and epitaxial growth station
  • Tool for handling wafers and epitaxial growth station

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0054] 1, the stage 1 for wafer epitaxial growth processing generally includes a reaction chamber 2, a transfer chamber 16, a cleaning chamber 13 and a storage area 17.

[0055] The storage area 17 generally contains a first cassette 14 containing wafers to be processed and a second cassette 15 containing wafers that have been processed in the stage.

[0056]The external robot 18 shown only in a very simplified manner in FIG. 1 takes out the wafers one by one from the cassette 14 and puts them in the cleaning chamber 13 before processing, and takes out the wafers one by one from the cleaning chamber 13 after the processing. Put them in box 15. Inside the transfer chamber 16, an internal automatic device 4 is provided, which takes out the wafers from the cleaning chamber 13 one by one before processing and inserts them into the reaction chamber 2, and after processing, takes out the wafers one by one from the reaction chamber 2 and takes them out Insert into the cleaning chamber 13...

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PUM

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Abstract

A tool ( 7 ) for handling a semiconductor material wafer ( 100 ) is designed to be used in an epitaxial growth station; the tool ( 7 ) comprises a disk ( 20 ) having an upper side ( 21 ) and a lower side ( 22 ), the lower side ( 22 ) being so shaped as to get in contact with the wafer ( 100 ) only along its edge ( 103 ); the disk ( 20 ) is provided internally with a suction chamber ( 24 ) that is in communication with the outside of the disk ( 20 ) through one or more suction holes ( 25 ) and in communication with a suction duct of an arm of a robot through a suction port ( 26 ); the disk ( 20 ) entirely covers the wafer ( 100 ) and the suction holes ( 25 ) open to the lower side ( 22 )of the disk ( 20 ), whereby, when the wafer ( 100 ) is in contact with the lower side ( 22 ) of the disk ( 20 ), it can be held by the tool ( 7 ) through suction.

Description

Technical field [0001] The present invention relates to tools for transporting wafers, particularly wafers of semiconductor material, and epitaxial growth stations using the same. Background technique [0002] In the equipment for manufacturing semiconductor integrated circuits (chips), the transfer of wafers is a very important item; in fact, it is necessary to avoid such a situation that the transferred wafers cause work defects in the final integrated circuits due to damage to their structures or their surfaces. type of damage. [0003] Typically, wafers are constructed of semiconductor material, but sometimes substrates in the form of slices of insulating material are also used. [0004] The wafer has a front side and a back side; the front side is the side of the wafer that forms the integrated circuit structure; therefore, it is particularly important not to cause damage to this surface of the wafer; in practice, it is required that this surface does not come into con...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00B65G49/07C23C16/44C30B35/00H01L21/205H01L21/677H01L21/683
CPCY10S414/141H01L21/6838H01L21/68
Inventor 弗兰科·普雷蒂文森佐·奥利亚里
Owner LPE