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Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof

A technology for measuring device and light beam, applied in the direction of measuring device, adopting optical device, measuring optics, etc., can solve the problems of difficulty, difficult adjustment of optical system, multiple adjustment parts, etc., and achieve the effect of high practicability

Inactive Publication Date: 2009-01-14
FUJI PHOTO OPTICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0012] However, the Mach-Zehnder type interferometer device for wavefront measurement has a large number of optical components and a large number of adjustment points, so there is a problem that it is very difficult to adjust the optical system.
In addition, the optical path of the reference light and the optical path of the light to be inspected must be arranged separately in space, so there is also a problem of increasing the size of the device.
In addition, the structure is such that the reference light and the test light pass through separate optical paths, so there are also problems such as being easily affected by vibration and difficult to install a phase shift mechanism.

Method used

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  • Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof
  • Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof
  • Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof

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no. 2 Embodiment approach

[0071] Next, a second embodiment of the light beam measurement device of the present invention will be described. FIG. 3 is a schematic configuration diagram of a light beam measurement device 10B according to a second embodiment of the present invention. Also, in the light beam measuring device 10B shown in FIG. 3 , common numbers are used for components common to the light beam measuring device 10A shown in FIG. Describe in detail.

[0072] The beam measuring device 10B shown in FIG. 3 includes the following components in addition to the components of the beam measuring device 10A shown in FIG. 2 . That is, as shown in FIG. 3 , the light beam measurement device 10B is arranged on the optical path between the light source unit 11 and the beam splitter 13 when measuring the light intensity of the light beam emitted from the light source unit 11. The reflective mirror 51 that reflects and derives the state at right angles downward in the figure, and the wattmeter 52 that meas...

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Abstract

The invention provides a wave front measuring interferometer unit provided with a compact optical system of simple constitution, and capable of regulating easily the optical system, and a light beam measuring instrument and method capable of measuring a wave front of a light beam and measuring a characteristic of a light beam spot. This light beam measuring instrument 10A is provided with a beam splitter 13 for splitting the light beam emitted from a light source part 11 into two beams, a semi-transparent reflection face 15a for reflecting one portion of the separated one light beam as a inspected light beam to a direction reverse to an incident direction, and a reflection type reference light generating means 23 for converting one portion of the transmitted light beam transmitted through the semi-transparent reflection face 15a into a wave front-faired reference light beam to be output. The wave front of the light beam, and the characteristic of the light beam spot are measured by such a manner.

Description

technical field [0001] The present invention relates to an interferometer device for measuring the wavefront of a light beam to be measured, and a light beam measuring device and method for measuring the wavefront of a light beam and various measurements of the converging point of the light beam. Background technique [0002] Conventionally, there is known a device (also referred to as a "beam profiler") that makes a point image of a light beam as a measurement object on an imaging surface such as a CCD and forms a point image, and determines the shape and size of the point image, etc. or the intensity distribution, the coordinates of the center of gravity, etc. (hereinafter, these are collectively referred to as "beam spot characteristic measurement") (see Patent Document 1 below). [0003] On the other hand, as an apparatus for measuring the wavefront of a light beam, there is known an interferometer apparatus for wavefront measurement including an optical system arrangeme...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J9/02G01B9/02
Inventor 葛宗涛斋藤隆行黑濑实
Owner FUJI PHOTO OPTICAL CO LTD
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