Automatic control device for electron-beam evaporation rate and control method thereof

An electron beam evaporation and evaporation rate technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating process, etc., can solve the problems of slow reaction, poor adjustment accuracy, unable to meet the requirements of fast, accurate and stable adjustment.

Inactive Publication Date: 2009-08-12
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
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  • Description
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AI Technical Summary

Problems solved by technology

The traditional electron gun power adjustment is achieved through mechanical potentiometers, such as manual rotary resistors, to adjust the voltage at the filament end. Manual adjustment has slow response, adjustment is entirely based on personal experience, and the adjustment accuracy is poor, which cannot meet fast, accurate and stable adjustment. requirements

Method used

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  • Automatic control device for electron-beam evaporation rate and control method thereof
  • Automatic control device for electron-beam evaporation rate and control method thereof
  • Automatic control device for electron-beam evaporation rate and control method thereof

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Embodiment Construction

[0032] The present invention will be further described below in conjunction with the examples, but the protection scope of the present invention should not be limited thereto.

[0033] Please see first figure 1 , figure 1 It is a schematic diagram of the overall structure of Embodiment 1 of the automatic control device for electron gun evaporation rate of the present invention. As can be seen from the figure, the electronic gun evaporation rate automatic control device of the present invention includes:

[0034] An evaporation rate detector 3, the crystal oscillator probe 31 of the evaporation rate detector 3 is placed in the vacuum chamber 9 of the electron beam evaporation coating machine to detect the instant electron beam evaporation rate;

[0035] Data acquisition card 2;

[0036] The electronic gun filament voltage regulating mechanism is composed of the digital-to-analog converter 21 of the data acquisition card 2, the thyristor intelligent voltage regulation module ...

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Abstract

An electron beam evaporation rate automatic control device for an optical coating machine and a control method thereof, the device includes an evaporation rate detection part, an electron gun filament voltage regulation part, a switching value input and output part and a program-controlled computer. The computer controlled by the program obtains the real-time evaporation rate from the rate detector, and obtains a control signal accordingly. The control signal is loaded on both ends of the filament through the output of the filament voltage adjustment part to adjust the evaporation power in real time to control the evaporation rate. During this process, the control program can receive external input and respond accordingly. The invention can carry out automatic feedback control on the evaporation rate of the electron gun, greatly improves the speed, precision and reliability of the whole equipment, and also improves the degree of intelligence.

Description

technical field [0001] The invention relates to optical coating, in particular to an electronic beam evaporation rate automatic control device for an electron beam evaporation coating machine and a control method thereof. Background technique [0002] Due to the needs of modern coating, many instruments and equipment are developing in the direction of intelligence. It is an urgent need for coating production to precisely control the operation of coating equipment and the change of coating parameters during the coating process through computer programs. Electron beam evaporation is a very important link in the entire optical coating process. Whether it can provide a stable evaporation rate during the entire coating process will directly affect the spectral index and yield of the coated product. The process of electron beam evaporation coating is that high-energy electron beams are incident on the surface of the target material to bombard and heat, so that the target material...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/54C23C14/30
Inventor 王善成易葵郭世海
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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