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Wetting and cleaning device for developer holding drum

A technology for cleaning devices and developing solutions, which is applied to spray devices, spray devices, electrical components, etc., can solve problems such as production line interruption and increase manufacturing costs, and achieve the effects of reducing emissions, reducing manufacturing costs, and improving quality and pass rate.

Inactive Publication Date: 2012-02-08
AU OPTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Although the above method can slightly reduce the crystals produced on the liquid storage drum, it still needs to stop the machine to clean up the remaining crystals, which will interrupt the production line and increase the manufacturing cost

Method used

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  • Wetting and cleaning device for developer holding drum
  • Wetting and cleaning device for developer holding drum
  • Wetting and cleaning device for developer holding drum

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] Such as figure 1 versus figure 2 As shown, it is the first preferred embodiment of the present invention.

[0023] The device 10 for wetting and cleaning the developer holding roller includes a developing chamber 11, a holding roller 12, a developing tank 13, a nozzle 14, and a pressure controller 15.

[0024] The development chamber 11 is provided with an entrance 111 and an exit 112, so that a substrate 20 exposed by the exposure device enters the development chamber 11 for a development process, and the substrate 20 is sent out through the exit 112 after the development process is completed.

[0025] The liquid holding roller 12 is arranged at the entrance 111 of the developing chamber 11 and is used to drive the substrate 20 into the developing chamber 11.

[0026] The developing tank 13 is located below the developing chamber 11 and is used for storing the developing solution.

[0027] A plurality of nozzles 14 are located at the bottom of the developing chamber 11 and con...

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PUM

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Abstract

A developing solution containing drum wetting and cleaning device, comprising: a developing chamber; a liquid containing roller, which is used to drive a substrate into the developing chamber; a developing tank, which stores the developing solution; at least one nozzle, which is located at the bottom of the developing The developing solution in the developing tank is sprayed to the liquid containing roller; and the pressure controller is used to control the flow and pressure sprayed by the nozzle, so that the liquid containing roller can be kept moist by the developing solution sprayed by the nozzle, and will not be caused by stagnation for too long crystals.

Description

technical field [0001] The invention relates to a wetting and cleaning device, in particular to a developing solution holding cylinder wetting and cleaning device. Background technique [0002] Usually, when manufacturing a thin film transistor liquid crystal display (TFT-LCD), the pattern of the thin film transistor must be made on a clean glass substrate first, and the process is similar to that of ordinary semiconductors. First, a thin film, such as a dielectric film or a metal film, must be deposited; then enter the photolithography process (photo process), spray a photoresist on the film, put a mask on it for exposure, and then send it to a developer (developer) for spraying. Sweep the developing solution to remove the photoresist after exposure, and make the photoresist layer stereotyped; finally, use etching to remove the exposed film, and remove the remaining photoresist after etching, which is The circuit pattern required for the transistor is completed. [0003] ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/26G03F7/32B05B1/30B05B1/02B05B1/14
Inventor 陈维绮颜骏翔涂锦识
Owner AU OPTRONICS CORP