Low-luster polishing agent combination and preparation method thereof

A polishing agent and composition technology, applied in the field of low-gloss polishing agent composition and its preparation, can solve the problems of decreased leveling, drag marks or brush marks, etc., and achieve the effect of solving the leveling problem

Inactive Publication Date: 2007-09-19
SHANGHAI SUNRISE POLYMER MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, if the general preparation method is used, that is, adding matting agent directly in the process of preparing the polishing agent, it will lead to a decrease in leveling, and cause drag marks or brush marks during the construction process.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Mix the ingredients in Table 1 as follows:

[0037] composition

Dosage

effect

Deionized water

28.74

solvent

Ammonium salt of perfluoroalkyl sulfonate (1%) Note 1

0.85

lubricant

Diethylene glycol monoethyl ether

4.83

Coalescent

Dibutyl phthalate

1.24

plasticizer

Tributoxyethyl Phosphate

2.26

leveling agent

Styrene / Acrylic Copolymer Emulsion (38%)

42.14

Film former

Polycarboxylate / Styrene Salt Emulsion (38%) Note 2

2.62

Alkali soluble resin

Polyethylene Wax Emulsion (35%)

2.28

wax emulsion

Silicone oil note 3

0.04

Defoamer

total

85.00

[0038] Note 1: The product name is FC-120, provided by 3M Company;

[0039] Note 2: The product name is ASR Plus, provided by Rohm and Haas;

[0040] Note 3: The product name is SWS-211, provided by Wacker Company.

[0041] Under the action of slow...

Embodiment 2

[0049] As in Example 1, mixture A was obtained.

[0050] Mix the components in Table 3 with Example 1 to obtain predispersion 2:

[0051] composition

Dosage

effect

Deionized water

13.40

carrier

Ammonia (28%)

0.03

pH regulator

Sodium polyacrylate

0.07

Dispersant

Silica (TS-100) Note 5

1.5

Matting agent

total

15.00

[0052] Note 5: The trade name TS-100 is provided by Degussa Company.

[0053] Same as in Example 1, mix the predispersion 2 and the mixture A uniformly to obtain the low-gloss polishing agent composition 2.

Embodiment 3

[0055] Mix the components in Table 4 with Example 1 to obtain mixture B:

[0056] composition

[0057] Silicone oil Note 8

[0058] Note 6: The product name is TEGOPREN-5840, provided by Degussa Company;

[0059] Note 7: The product name is ASR Plus, provided by Rohm and Haas;

[0060] Note 8: The product name is SWS-211, provided by Wacker Company.

[0061] Mix the components in Table 5 with Example 1 to obtain predispersion 3:

[0062] composition

[0063] As in Example 1, mix the predispersion 3 and the mixture B evenly to obtain the low-gloss polishing agent composition 3.

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PUM

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Abstract

The invention discloses a low gloss polishing agent composition and preparation method thereof. Main character of the polishing agent composition is: at least containing one metal crosslinking or self-crosslinking polymer film forming agent, one dulling agent, and one dispersant. The polishing agent composition employs the dispersant to carry pre-dispersion operation of inorganic dulling agent, thereby effectively increasing decentrality of the dulling agent and benefiting leveling property of itself. The disclosed polishing agent composition coated on surface of ground and working bench can generate low gloss and unsmoothed effect and is adapted for special demand of surface.

Description

technical field [0001] The invention relates to the technical field of chemical industry, in particular to a low-gloss polishing agent composition and a preparation method thereof. Background technique [0002] Polishing agent is widely used in coating the surface of various materials to modify, repair and protect the surface of these materials, and selectively increase the water resistance, wear resistance, anti-skid, stain resistance and other properties of the surface of these materials. A polish or wax is usually applied to an old surface to renew the surface and restore the gloss. Such polishes are generally associated with shiny, ie, high-gloss surfaces, and when a polish is applied to an old surface, the gloss or brilliance of the surface increases significantly. [0003] Commercially available traditional polishes generally apply a layer of high-gloss coating on objects such as floors, furniture, shoes, etc., while requiring their surfaces to be smooth and clean. A...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/10
Inventor 郑柏存傅乐峰卢立勋
Owner SHANGHAI SUNRISE POLYMER MATERIAL CO LTD
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