Semiconductor device and its manufacturing method
A technology for semiconductors and devices, applied in the field of miniaturized semiconductor devices, can solve the problems of poor connectivity, difficult semiconductor devices, poor connectivity (poor solder wettability, etc.), and achieve the effect of high reliability
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[0034] Below, refer to Figure 1- Figure 12 , the semiconductor device and its manufacturing method according to the present invention will be described.
[0035] As shown in FIG. 1, the semiconductor device of the present embodiment has a lower IGBT (insulated gate bipolar transistor) (1) as a lower semiconductor element, and a lower portion formed on the upper surface (1a) of the lower IGBT (1). The electrode layer (5), the spacer electrode layer (gate pad) (18) which is separated from the lower electrode layer (5) and formed on the upper surface (1a) of the lower IGBT (1), and the electrode layer (gate pad) (18) formed on the lower electrode layer (5) ), the upper electrode layer (6) on the upper surface (5a) of the upper electrode layer (6), the upper IGBT (2 ), the uppermost electrode layer (27) formed on the upper surface (2a) of the upper IGBT (2), the non- A conductive protective film (9), and a non-conductive protective film (29) covering part of the uppermost elect...
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