Surface treatment, specification and assembling method for microelectronic element and its storage structure
A technology for microelectronic components and surface treatment, applied in electrical components, circuits, semiconductor/solid-state device manufacturing, etc., to solve the problems of chip corrosion, delamination, product debris, etc.
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[0034] 1A to 1B are cross-sectional views of a surface treatment process of a microelectronic element according to a first embodiment of the present invention.
[0035] Please refer to FIG. 1A first. The present invention proposes a surface treatment method for microelectronic components, which is suitable for a chip 10 that has completed the back-end process (BEOL), wherein the chip 10 is, for example, composed of a substrate 100, several layers of dielectric layers 102, 104 and 110 , the plug 106 and the pad 108 are formed. The solder pads 108 and the outermost dielectric layer 110 are exposed on the surface of the chip 10 . The above structure of the chip 10 is just an example, and is not intended to limit the scope of application of the present invention.
[0036] Next, please refer to FIG. 1B , the method of this embodiment is to form a layer of solvent-soluble polymer layer (solvent dissolvable polymer layer) 120 on the surface of the chip 10, and its thickness is, for ...
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