Microlenses of cmos image sensor and method for fabricating the same

Abstract

A microlens of a CMOS image sensor and a manufacturing method thereof, the method includes at least one of the following steps: forming a color filter array including a plurality of color filters on a semiconductor substrate. A flat layer is formed on and / or over the color filter array to compensate for height differences between the color filters. A silicon oxide layer is formed on and / or over the planarization layer. A plurality of photoresist patterns corresponding to the color filters are formed on and / or over the silicon oxide layer, wherein the photoresist patterns are separated from each other. A plurality of CxFy-based polymer bumps surrounding a plurality of photoresist patterns are formed using at least one process gas (eg, C5F8, CH2F2, Ar, and / or O2). Etching the plurality of polymer bumps, the plurality of photoresist patterns, and the oxide layer using an etch recipe having substantially the same etch selectivity between the plurality of polymer bumps, the plurality of photoresist patterns, and the silicon oxide layer silicon layer.

Description

[0001] This application claims priority from Korean Patent Application No. 10-2006-0072040 (filed on Jul. 31, 2006), the entire content of which is hereby incorporated by reference. technical field [0002] The invention relates to a microlens of a CMOS image sensor and a manufacturing method thereof. Background technique [0003] An image sensor is a device that receives light at a photodiode or phototransistor and uses an analog-to-digital converter (ADC) to convert the light into an electrical digital image signal. Two different image sensors are Complementary Metal Oxide Semiconductor (CMOS) devices and Charge Coupled Devices (CCD). CMOS devices can be used in small cameras with low power. In a CMOS device, a microlens (which may be exposed to air) focuses light onto a photodiode. A photodiode converts the collected light into an electrical signal. Multiple transistors can display the converted electrical signal as an image. [0004] A CMOS device may include a photo...

AI Technical Summary

Problems solved by technology

Difficulty standardizing microlens focal lengths due to variations in the manufacturing process, limiting microlens reproducibility

For example, it is difficult to standardize reflow processing

Images