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Trap device

A collection device and condensing device technology, applied in the direction of machine/engine, mechanical equipment, radial flow pump, etc., can solve problems such as pump mechanism damage

Inactive Publication Date: 2008-02-27
EDWARDS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, when tungsten hexafluoride passes through the heat pump, tungsten deposits will form in the pump, which will cause damage to the pump mechanism

Method used

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Examples

Experimental program
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Embodiment Construction

[0042] Referring to FIG. 1, a processing system (such as for semiconductor or flat panel display devices) includes a process chamber 10 having at least one inlet for receiving one or more process gases and for discharging unconsumed An outlet 12 for the process gas which is not consumed also includes by-products of the process carried out in the process chamber 10 . The outlet 12 of the process chamber 10 is connected by a line 14 to an inlet 16 of a collection device 18 for removing substances from the gaseous stream emitted from the process chamber 10 . The collection device 18 comprises an outlet 20 which is connected to an inlet 22 of a vacuum pump 24 for drawing a gas flow from the process chamber 10 . The vacuum pump 24 has a discharge port 26 which is connected to the inlet of the backing pump or to the inlet of the scrubber as required.

[0043] FIG. 2 is a perspective view of one example of collection device 18 . The collection device 18 comprises a cylindrical hous...

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PUM

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Abstract

A trap device (18) is described for removing species from a gas stream drawn from an enclosure by a vacuum pump. The trap comprises a casing (28) having an inlet (16) connectable to the enclosure for receiving the gas stream therefrom and an outlet (20) connectable to the vacuum pump for exhausting the gas stream from the casing. A plurality of cartridges are each removably insertable into the casing through a respective aperture (36) of the casing (28) and provide a respective flow passage between an inlet and an outlet thereof for gas passing through the casing, each cartridge housing means for removing species from the gas passing therethrough as solid material collecting within the cartridge.

Description

technical field [0001] The present invention relates to a collection device, and more particularly to a collection device for removing material from a gas stream drawn by a vacuum pump from a closed container. Background technique [0002] During semiconductor processing, such as chemical vapor deposition processing, deposition gases are supplied into a process chamber to form a deposition layer on the surface of a substrate. When the residence time of the deposition gas in the process chamber is relatively short, only a small portion of the gas supplied into the chamber is consumed during the deposition process. As a result, unconsumed gas molecules drawn from the chamber by the vacuum pump pass through the pump in a highly reactive state. [0003] Many semiconductor processes use or generate solid, condensable or sublimable compounds. For example, a low pressure chemical vapor deposition silicon nitride (LPCVD nitride) process uses chlorosilanes (such as dichlorosilane o...

Claims

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Application Information

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IPC IPC(8): C23C16/44
CPCC23C16/4412F04D17/168C23C16/4586H01L21/67207C23C16/345H01L21/02365
Inventor D·恩格兰P·迪克松M·C·霍普
Owner EDWARDS LTD