Balance mass orientation system for workpiece platform

Abstract

The invention provides a workpiece console quality balancing and locating system, which is used to reduce the vibration of the workpiece console in a lithography machine and comprises an X axis long stroke module and a Y axis long stroke module so that a silicon chip plummer can move independently in X and Y directions relative to the system frame; a rectifying and antishifting device is used to compensate the locations shifting of the quality balancing system frame in X, Y and Rz directions; a vertical slightly adjusting and gravity compensation device, which is arranged between the X axis long stroke module and the Y axis long stroke module and the loading microchecker, is used to support almost all static weight of the silicon chip micorchecker and also has the function of slight adjustment of the degree of freedom in Z, Rx and Ry directions. In the invention and specific to the exposure system of the photolithographic silicon chip of big diameter, a quality balancing method is adopted for the workpiece console so as to reduce and eliminate the horizontal reaction force of motion and the unfavorable effect on the exposure system due to the change of the system gravity; the vertical slightly adjusting and gravity compensation device of special design ensures the vertical vibration reduction and isolation as well the precise location function of the silicon chip loading microchecker.

Description

technical field [0001] The invention relates to a workpiece table balanced mass positioning system applied in a photolithography machine, in particular to a workpiece table balanced mass positioning system with a gravity compensation and vertical precision positioning device. Background technique [0002] Photolithography refers to the complex process of sequentially transferring the chip patterns on a series of reticles to the corresponding layers of the silicon wafer through the exposure system. The entire photolithography process consumes about 60% of the chip front-end manufacturing time, accounting for nearly 40% of the cost of the entire chip manufacturing. This series of complex, expensive, and time-consuming lithography processes is concentrated on a group of lithography machines corresponding to the chip front-end production line. Therefore, the lithography accuracy and yield of the lithography machine directly affect the integration and productivity of the chip. m...

AI Technical Summary

Problems solved by technology

However, this method of actively offsetting and compensating the reaction force on the basis of the original model frame is limited by the development bottleneck of lithography technology, and it is only an expedient measure.

[0006] Another traditional mass positioning system of the workpiece table has double-layered balance masses to counteract the motion reaction force, that is, a mechanism equivalent to the balance mass is introduced in both directions of the stepping and scanning of the workpiece table to offset the stepping and The impact of the movement reaction force in the scanning direction on the lithography system. At the same time, the center of gravity of the workpiece table system remains unchanged during the entire exposure process, but due to the addition of components, the price is relatively high

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