Aluminum alloy antifriction layer flexible tin phase particles thinner PVD bushing magnetron sputtering technique
A technology of magnetron sputtering and aluminum alloy, which is applied in metal material coating process, sputtering coating, coating, etc., can solve the limitation of PVD bearing pad compliance or running-in performance and wear resistance, and cannot meet the requirements of PVD bearing pad operation Requirements and other issues to achieve the effect of improving compliance and running-in, improving wear resistance and reducing friction
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Embodiment 1
[0018] As shown in Figure 1, Figure 2, and Figure 3, through the PVD bearing bush magnetron sputtering process of negative bias cleaning before sputtering the bearing bush in the sputtering cabin, the conventional method of producing PVD bearing bushes is first used outside the cabin through chemical degreasing and pickling , electrolytic degreasing, ultrasonic cleaning, processing tank, driving, oven, rectifier, control subsystem, etc. for pre-sputtering treatment, loading bearing bushes into the fixture in the magnetron sputtering cabin, vacuuming the magnetron sputtering cabin, and sputtering nickel Gate layer (Ni)4. Sputtering an aluminum alloy antifriction layer (AlSnCu) 6, the process conditions of the sputtering aluminum alloy antifriction layer 6: first prepare an aluminum alloy target material, and the weight percentage of pure tin in the aluminum alloy target material is 16% to 25% The weight percentage of pure copper is 0.3%~3%; the weight percentage of pure aluminu...
Embodiment 2
[0025] As shown in Figure 1, Figure 2, and Figure 3, the PVD bearing bush magnetron sputtering process through the negative bias cleaning of the bearing bush in the sputtering chamber before sputtering, the distance between the PVD bearing bush substrate and the aluminum alloy target is 120mm; The temperature in the aluminum alloy (AlSnCu) antifriction layer sputtering chamber is 98°C; the working gas argon partial pressure is within the range of 1.2Pa; the negative bias voltage of the PVD bearing substrate is -160V. All the other processes and equipment used are the same as in Example 1.
Embodiment 3
[0027] As shown in Figure 1, Figure 2, and Figure 3, the PVD bearing bush magnetron sputtering process through the negative bias cleaning of the bearing bush in the sputtering cabin before sputtering, the distance between the PVD bearing bush substrate and the aluminum alloy target is 90mm; The temperature in the aluminum alloy (AlSnCu) antifriction layer sputtering chamber is 70°C; the working gas argon partial pressure is within the range of 0.6Pa; the negative bias voltage of the PVD bearing substrate is -120V. All the other processes and equipment used are the same as in Example 1.
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