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Method for rapid accurate determination of superelevation reflectance ratio eyeglass

A reflectivity and fast technology, applied in the testing of optical performance, scattering characteristic measurement, etc., can solve the problems of time-consuming and laborious debugging, low measurement accuracy, etc., and achieve the effect of reducing adjustment difficulty and absolute error.

Inactive Publication Date: 2008-09-03
SHANXI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the problems of relatively low measurement accuracy and time-consuming and labor-intensive debugging of existing methods for measuring ultra-high reflectivity lenses, the present invention provides a method for quickly and accurately measuring ultra-high reflectivity lenses

Method used

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  • Method for rapid accurate determination of superelevation reflectance ratio eyeglass
  • Method for rapid accurate determination of superelevation reflectance ratio eyeglass
  • Method for rapid accurate determination of superelevation reflectance ratio eyeglass

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Embodiment Construction

[0022]The method for quickly and accurately measuring ultra-high reflectivity lenses is realized by the following steps: (1) construct an optical cavity (also known as Fapoli-Perot or F-P cavity) including two cavity mirrors, one of the two cavity mirrors is used as a calibration moving plate 8 is placed on the piezoelectric ceramic 9, and the other is used as the static piece 7 to be measured; a matching lens 6 is set at the incident end of the optical cavity, and a fast photodetector 10 is set at the transmission end of the optical cavity; the output end of the fast photodetector is connected to the The oscilloscope 11 is connected to the signal input end of a comparison switch circuit 12, and the optical path fast controllable switch 5 is arranged on the incident light path of the optical cavity, and the controlled end of the light path fast controllable switch is connected to the output end of the comparison switch circuit. In specific implementation, when constructing the ...

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Abstract

The invention relates to the optical element parameter measurement, particularly relates to a fast and accurate method for testing eyeglass with ultra-high reflectivity. In order to solve the problem that the prior art of testing eyeglass with ultra-high reflectivity has low measurement precision and the debug takes time and labor. The invention includes the following steps: (1) constructing the optical cavity and the affiliated members; (2)coinciding the reference light source and the measuring light source in space; (3) adjusting the calibration moving plate; (4) accurately adjusting the optical path closure degree of the optical cavity; (5) fine adjusting the place of the matching lens, determining the fundamental transverse mode, and causing the laser light source fundamental transverse mode to match with the fundamental transverse mode of the tested optical cavity effectively; (6) fitting by the characteristic time I(t)=I0exp(-tcL / 2d) and obtaining the total loss L of the tested cavity. The invention introduces the visible light source as the reference light which greatly reduces the difficulty of adjusting of the cavity. The invention can measure and screen the optical lens with high quality in batch. The test precision of the method provided by the invention is higher than 5x10-7.

Description

technical field [0001] The invention relates to the measurement of optical element parameters, in particular to a method for quickly and accurately measuring ultra-high reflectivity lenses. Background technique [0002] Due to its extremely low loss, ultra-high reflectivity (ultra-low loss) optical lenses play an extremely important role in many aspects of modern laser technology, especially optical precision measurement, optical ultra-sensitive analysis, spectroscopy and astronomical observation systems. However, due to its high processing technology difficulty and its high susceptibility to irreversible decline in reflectivity during use and storage, such as scratches on the reflective film of the lens, accurate measurement of the reflectivity of ultra-high reflectivity lenses is of great importance to lens manufacturers. It is of great significance to users and users. With the advancement of materials and coating technology and the requirements of extreme conditions, opti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02G01N21/55
Inventor 李志刚张玉驰李刚张天才
Owner SHANXI UNIV
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