Nozzle cleaning apparatus

A technology for cleaning devices and nozzles, applied in the directions of spray devices, cleaning hollow objects, cleaning methods and utensils, etc., can solve the problems that the treatment liquid cannot fully clean the nozzles, damage and other problems, and achieve the effects of long life, variable life, and prevention of scattering

Inactive Publication Date: 2008-12-03
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] As described in Japanese Patent Application Publication No. JP2005-262127, when the nozzle is cleaned only by the cleaning liquid, there are cases where the nozzle cannot be sufficiently cleaned due to the different types of the p...

Method used

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Embodiment Construction

[0035] Embodiments of the present invention will be described below with reference to the drawings. figure 1 is a perspective view of a coating device to which the nozzle cleaning device of the present invention is applied, figure 2 is its side view. In addition, in figure 1 The illustration of the pre-dispense mechanism 2, the nozzle cleaning device 6, etc. is omitted in FIG. In addition, in figure 2 The illustration of the carrier 4 etc. is omitted in FIG.

[0036] This coating device is used to coat, for example, a resist including a pigment called a color resist on a glass substrate (hereinafter referred to as “substrate”) W for a rectangular liquid crystal panel.

[0037] This coating apparatus includes a stage 3 for holding a substrate W. As shown in FIG. The stage 3 is made of a cuboid-shaped stone, and its upper surface is a horizontal plane, which serves as a holding surface 30 for the substrate W. As shown in FIG. A plurality of vacuum suction ports (not show...

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PUM

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Abstract

The invention provides a nozzle cleaning device capable of sufficiently and cleanly cleaning nozzles during a long time. A cleaning region (61) includes: a pair of spraying preventing plate (73); four regions (75) for ejecting inert gas with slots (77, 78) for ejecting the inert gases; a clapboard (74); a lower cleaning brush (82), a right side cleaning brush (83) and a left side cleaning brush (81) all supported by a support member; a pair of regions for nozzles supporting a first nozzle (87), a second nozzle (84) and a third nozzle (85, 86). When the cleaning region is arranged in a cleaning zone, the lower cleaning brush is arrange to be able to abut against the position below a lower end of the slot nozzle; the right side cleaning brush is arrange to be able to abut against the position at right side of the lower end in a length direction of the slot nozzle; the left side cleaning brush is arrange to be able to abut against the position at left side of the lower end in the length direction of the slot nozzle.

Description

technical field [0001] The present invention relates to a nozzle cleaning device for cleaning a treatment liquid supply nozzle which discharges a treatment liquid from a slit-shaped discharge port formed at the lower end of a long slit nozzle. Background technique [0002] In a coating device for coating a processing liquid such as a photoresist on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display panel, or a mask substrate for a semiconductor manufacturing device, through the lower end of a long slit nozzle The processing liquid is discharged from the slit-shaped discharge port formed in the part, and the processing liquid is applied to the substrate surface. In this coating device, the nozzle cleaning device cleans the nozzles contaminated by coating the treatment liquid. [0003] For example, as such a nozzle cleaning device, there is used a nozzle cleaning device that cleans the nozzle by supplying a cleaning liquid to the lower e...

Claims

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Application Information

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IPC IPC(8): B05B15/02
CPCB05B12/16B05B15/555B08B1/002B08B1/02B08B9/0321
Inventor 高木善则
Owner DAINIPPON SCREEN MTG CO LTD
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