Manufacturing method of green light LED
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- EPILIGHT TECH
- Publication Date
- 2009-02-04
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Abstract
Description
technical field
[0001] The invention relates to a metal organic vapor deposition (MOCVD) epitaxial growth method of a III-V nitride material based on gallium nitride (GaN), in particular to a manufacturing method of a green light emitting diode. Background technique
[0002] GaN-based III-V nitrides are important direct-bandgap wide-bandgap semiconductor materials. GaN-based materials have excellent material mechanical and chemical properties, excellent photoelectric properties, and their bandgap ranges from 0.7eV (InN) to 6.2eV (AlN) at room temperature. Deep ultraviolet, GaN-based materials have a wide range of application backgrounds in the field of optoelectronic devices such as blue light, green light, purple light and white light diodes.
[0003] In recent years, the external quantum efficiency of GaN-based blue LEDs has been greatly improved, reaching 45% (see: Appl. Phys. Lett 89, 071109), but the external quantum efficiency of green light-emitting diodes is much lo...