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Manufacturing method of optical waveguide

A manufacturing method and optical waveguide technology, applied in the direction of optical waveguide light guide, light guide, optics, etc., can solve the problems of reduced positioning accuracy, difficulty in visual inspection or optical detection, and difficult detection, so as to achieve improved positioning accuracy and excellent tight adhesion , Excellent dimensional accuracy

Inactive Publication Date: 2009-02-18
NITTO DENKO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In such a case, when positioning the above-mentioned exposure mask, it becomes difficult to visually or optically detect the alignment mark on the substrate, and the positioning accuracy tends to decrease.
In particular, when the upper cladding layer is formed of the same material as the lower cladding layer, since the alignment mark is transparent, it becomes more difficult to visually or optically detect the alignment mark.

Method used

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  • Manufacturing method of optical waveguide
  • Manufacturing method of optical waveguide
  • Manufacturing method of optical waveguide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] [Materials for forming the lower cladding layer and the upper cladding layer]

By mixing 35 parts by weight of bisphenoxyethanol fluorene diglycidyl ether (ingredient A), 40 parts by weight of 3', 4'-epoxycycloethylmethyl-3 as an alicyclic epoxy resin, 4-epoxycyclohexanecarboxylate (manufactured by Daicel Chemical Co., Ltd., Slokisaid 2021P) (component B), 25 parts by weight of (3',4'-epoxycyclohexane)methyl-3',4 '-Epoxycycloethyl carboxylate (manufactured by Daicel Chemical Co., Ltd., Surokiside 2081) (component C), 1 part by weight of 4,4'-bis[bis(β-hydroxyethoxy)phenylsulfinyl ] 50% pentanone carbonate solution of phenyl sulfide bishexafluoroantimonate (photooxygen (photoacid) generator: component D) to prepare materials for forming the lower cladding layer and the upper cladding layer.

[0035] [forming material of nucleus]

By adding 70 parts by weight of the above-mentioned component A, 30 parts by weight of 1,3,3-tri{4-[2-(3-oxetanyl (Oxetanil))] butoxyphenyl} ...

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Abstract

The aim of the present invention is to provide an optical waveguide production method for producing an optical waveguide path with an alignment mark. When an optical waveguide path is produced on a substrate (1), an under-cladding layer (2) and an alignment mark (A) are formed from the same material on the substrate; then, a photosensitive resin layer (3a) for forming a core (3) is formed on the substrate to cover a thin metal film (B), and an exposure mask (M2) for forming the core (3) is positioned with reference to the thin metal film (B) detected by the photosensitive resin layer (3a).

Description

technical field [0001] The present invention relates to a method of manufacturing an optical waveguide widely used in optical communication, optical information processing, and other general optics. Background technique [0002] Optical waveguides are incorporated into optical devices such as optical waveguide devices, optical integrated circuits, and optical wiring substrates, and are widely used in optical communications, optical information processing, and other general optical fields. In an optical waveguide, a core serving as a passage of light is usually formed in a predetermined pattern, and an undercladding layer and an overcladding layer are formed so as to cover the core (for example, refer to Patent Document 1 (JP-A-2005-173039)). When manufacturing such an optical waveguide, it is usually formed by laminating layers in this order on a substrate, such as a lower cladding layer, a core layer, and an upper cladding layer. [0003] When forming these lower cladding ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/138G02B6/13
CPCB29D11/00663G02B6/136G02B6/138G02B2006/12173
Inventor S·R·卡安
Owner NITTO DENKO CORP