Method for detecting photolithography equipment exhaust system and judging product CPK

An exhaust system and product technology, applied in the direction of microlithography exposure equipment, photolithography exposure equipment, etc., can solve the problems of wasting manpower, low pass rate, and reducing machine work efficiency, etc.

Inactive Publication Date: 2009-03-04
SEMICON MFG INT (SHANGHAI) CORP
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Problems solved by technology

The traditional method of detecting the exhaust system of a machine is to judge that there may be a problem with the exhaust system of the machine when the qualified rate of the product is found to be low. Since the relevant parameters of the exhaust system of the machine cannot be obtained in time,

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  • Method for detecting photolithography equipment exhaust system and judging product CPK
  • Method for detecting photolithography equipment exhaust system and judging product CPK
  • Method for detecting photolithography equipment exhaust system and judging product CPK

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Embodiment Construction

[0028] The present invention provides a new method for detecting the exhaust system of a machine in the field of lithography, and its specific details are described as follows:

[0029] The photolithography process uses an exposure machine and an orbital machine. We know that the exhaust system of the machine is a factor affecting the thickness of the photoresist, and the rocking curve shows that the feature size will change with the thickness of the photoresist. In order to accurately detect the current status of the exhaust system, photolithography process engineers usually select a point on the swing curve for detection. At this point, when the thickness of the photoresist changes slightly, the feature size of the product will change. This change is magnified. So this point is sensitive enough to detect the exhaust system.

[0030] When a lithography process engineer selects a photoresist and draws a swing curve, he / she can arbitrarily select a point on the swing curve an...

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Abstract

The present invention relates to a method for detecting the exhaust system of a machine in the lithographic field. The method mainly comprises the following steps: selecting an optical resistance and mapping out the swinging curve; selecting a point on the swinging curve at random as detection point, and finding out the thickness of the optical resistance at the point; coating the optical resistances with the thickness on wafers; summarizing the characteristic sizes of the wafers; and comparing the data of the characteristic sizes of the wafers. If the data is within the standard variance range, the exhaust system of the machine equipment is proved to be excellent; if the data is not within the standard variance range, the process log is required to be detected to determine the exhaust device with a failure; and then the equipment engineer detects the exhaust system of the equipment. The present invention can be used for detecting whether the exhaust system has the failure without stopping the machine, so the present invention can not only improve the operation efficiency of the machine, but also save the labor.

Description

technical field [0001] The invention relates to a method for detecting a machine exhaust system and a method for judging a product CPK (process capability index), in particular to a method for detecting a machine exhaust system and judging a product CPK in the field of lithography. Background technique [0002] In the field of photolithography, the exhaust system of the machine can affect the feature size of the product. The traditional method of detecting the exhaust system of a machine is that when the pass rate of the product is found to be low, it is judged that there may be a problem with the exhaust system of the machine. Since the relevant parameters of the exhaust system of the machine cannot be obtained in time, in order to verify the exhaust Whether there is a problem with the gas facility, the equipment engineer usually has to stop the machine for inspection to determine which part of the exhaust system is faulty. This not only reduces the working efficiency of t...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 柳会雄张轲余云初王跃刚
Owner SEMICON MFG INT (SHANGHAI) CORP
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