Method for detecting photolithography equipment exhaust system and judging product CPK

An exhaust system and product technology, applied in the direction of microlithography exposure equipment, photolithography exposure equipment, etc., can solve the problems of wasting manpower, low pass rate, and reducing machine work efficiency, etc.
CN101377622AInactive Publication Date: 2009-03-04SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
SEMICON MFG INT (SHANGHAI) CORP
Publication Date
2009-03-04
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The present invention relates to a method for detecting the exhaust system of a machine in the lithographic field. The method mainly comprises the following steps: selecting an optical resistance and mapping out the swinging curve; selecting a point on the swinging curve at random as detection point, and finding out the thickness of the optical resistance at the point; coating the optical resistances with the thickness on wafers; summarizing the characteristic sizes of the wafers; and comparing the data of the characteristic sizes of the wafers. If the data is within the standard variance range, the exhaust system of the machine equipment is proved to be excellent; if the data is not within the standard variance range, the process log is required to be detected to determine the exhaust device with a failure; and then the equipment engineer detects the exhaust system of the equipment. The present invention can be used for detecting whether the exhaust system has the failure without stopping the machine, so the present invention can not only improve the operation efficiency of the machine, but also save the labor.
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Description

technical field

[0001] The invention relates to a method for detecting a machine exhaust system and a method for judging a product CPK (process capability index), in particular to a method for detecting a machine exhaust system and judging a product CPK in the field of lithography. Background technique

[0002] In the field of photolithography, the exhaust system of the machine can affect the feature size of the product. The traditional method of detecting the exhaust system of a machine is that when the pass rate of the product is found to be low, it is judged that there may be a problem with the exhaust system of the machine. Since the relevant parameters of the exhaust system of the machine cannot be obtained in time, in order to verify the exhaust Whether there is a problem with the gas facility, the equipment engineer usually has to stop the machine for inspection to determine which part of the exhaust system is faulty. This not only reduces the working efficiency of t...

Claims

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