The invention discloses a photoethcing self assembly preparation method of a patterned BiFeO3 film. The method comprises the following steps: (1) selecting a common slide glass as a substrate, cutting the glass substrate, performing ultrasonic cleaning, drying, and irradiation in an ultraviolet light irradiation instrument, respectively; (2) immersing the glass substrate irradiated by ultravioletlight in OTS-toluene solution to form an OTS monomolecular film on the surface of the substrate, after the immersing, cleaning the substrate with acetone, blow-drying, stoving, irradiating the substrate, with a photomask covering thereon, under ultraviolet light to obtain a patterned functional self-assembled film; (3) preparing BiFeO3 precursor solution, placing an OTS-SAMs matrix of the patterned functional self-assembled film in the prepared precursor solution, performing deposition, supersonic wave concussion cleaning and annealing to obtain the photoetching self-assembled patterned BiFeO3 film. The method provided by the invention combines liquid phase deposition method and photoetching self-assembled monolayers technology to obtain the patterned BiFeO3 film. The film has the following advantages: the edge contour is clear, and the film is firmly bonded to the substrate.