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Precleaning method of reaction system

A reaction system and pre-cleaning technology, applied in cleaning methods and utensils, cleaning methods using gas flow, chemical instruments and methods, etc., can solve the problems of complicated operation, difficulty in ensuring the pre-cleaning effect, etc., and achieve enhanced particle peeling. effect, enhanced particle removal effect, reduced time consumption effect

Inactive Publication Date: 2009-03-25
SEMICON MFG INT (SHANGHAI) CORP +1
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Problems solved by technology

However, since the above-mentioned charging stage is used to set and read environmental parameters and self-calibration and confirmation of the machine, the discharge stage is used to restore the environmental state, such as exhaust, cooling, etc.; that is The above method is to pre-clean the reaction system during the adjustment stage of the machine, which is difficult to ensure the pre-cleaning effect and easily leads to complicated operations.

Method used

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  • Precleaning method of reaction system
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Embodiment Construction

[0025] Although the invention will be described in more detail below with reference to the accompanying drawings, in which preferred embodiments of the invention are shown, it should be understood that those skilled in the art can modify the invention described herein and still achieve the advantageous effects of the invention. Therefore, the following description should be understood as a broad instruction for those skilled in the art, rather than as a limitation of the present invention.

[0026] In the interest of clarity, not all features of an actual implementation are described. In the following description, well-known functions and constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be appreciated that in the development of any actual embodiment, numerous implementation details must be worked out to achieve the developer's specific goals, such as changing from one embodiment to another in accordance with sy...

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Abstract

Disclosed is a pre-cleaning method of a reaction system, comprising: confirming a cooling region taking a first temperature and a second temperature as boundary values, wherein, the first temperature is higher than the second temperature; executing the pretreatment operation so as to make the temperature in the reaction system be the first temperature; executing the cooling operation from the first temperature to the second temperature; beginning to execute the vacuum pumping operation in the cooling process; executing the air suction and heating-up operation after the temperature is reduced to the second temperature so as to make the temperature in the reaction system be the reaction temperature at least. The invention can reduce the pre-cleaning time to improve the production efficiency, and can also enhance the micro-particle removing effect.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for pre-cleaning a reaction system. Background technique [0002] The silicon wafer heat treatment process involved in the semiconductor process requires a wide range of application of various reaction systems, such as deposition reaction systems, etching reaction systems, and oxidation systems. In practice, after the heat treatment operation is completed, a film layer with a certain thickness and distribution and particles on it usually remain on the wall of the reaction system. After undergoing a heat treatment process, the particles are prone to exfoliation. The exfoliated particles will travel with the air and lodge on the wafer, causing defects and lower yields. Therefore, in actual production, in order to reduce particles, nitrogen (N 2 ) Periodically pre-clean the reaction system. [0003] Such as figure 1 As shown, the step of pre-cleanin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/04B08B7/00B08B5/04H01L21/00
Inventor 朴松源何有丰白杰唐兆云
Owner SEMICON MFG INT (SHANGHAI) CORP
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