Pixel structure, display panel and method for manufacturing optoelectronic device
A manufacturing method and technology of pixel structure, applied in the field of display panel and optoelectronic device manufacturing, pixel structure, can solve the problems of high production cost, complicated steps, inability to effectively increase production capacity, etc., to increase production capacity, shorten process time, capacitance Value boost effect
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[0064] Figure 1A to Figure 1J Is a schematic cross-sectional view of a method for manufacturing a pixel structure according to an embodiment of the present invention, wherein Figure 1A~Figure 1J The description is based on a pixel structure. First of all, please refer to Figure 1A , A substrate 120 is provided, and the substrate 120 has a transistor area At, a capacitor area Ac, and a pixel area Ap. Each of the transistor area At, the capacitor area Ac, and the pixel area Ap of the present invention is illustrated as an example, but is not limited thereto. In other embodiments, at least one of the transistor area At, the capacitor area Ac, and the pixel area Ap may be at least one of the above-mentioned transistor area At, capacitor area Ac, and pixel area Ap according to the needs of the design, such as different viewing areas, increased capacitance, different control capabilities More than one. Next, a gate 200 is formed in the transistor area At of the substrate 120 and a c...
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