Electron beam recording apparatus

Abstract

An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.

Description

technical field [0001] The present invention relates to an electron beam recording apparatus for recording information by irradiating an electron beam to a predetermined position, and more particularly to an electron beam recording apparatus for producing a master of optical disk by using an electron beam printing pattern . Background technique [0002] In recent years, there has been an increasing demand for precision improvements in microfabrication techniques such as mastering optical disc exposure techniques and semiconductor techniques. For example, optical discs are produced by a master disc production process for producing a stamper from a glass plate, and a magnetic disk production process for producing an optical disc with an injection mold on which a stamper is mounted. [0003] In a typical master production process, the master production machine emits visible light, ultraviolet laser, etc. from a light source in the surrounding environment, and focuses the light...

AI Technical Summary

Problems solved by technology

The generated magnetic field affects the electron beam, which prevents precise correction of the focus and leads to a reduction in exposure quality

[0022] Referring to the electron beam irradiation apparatus of Patent Document 3, according to the method of correcting the displacement of the focus of the electron beam on the master disk due to the change of the magnetic field and adjusting the focus of the electron beam with respect to the target object, the irradiation point of the electron beam is estimated due to a plurality of magnetic detectors The magnetic field nearby, so it is not possible to accurately calculate the disturbing magnetic field in the injecting part of the electron beam

Therefore, the electron beam irradiating apparatus in Patent Document 3 cannot accurately correct the focus, and thus the exposure quality is degraded

[0023] In addition, according to Patent Document 3, due to the equipment configuration, in order to eliminate the influence of the earth's magnetic force, the entire electron beam irradiation equipment must be magnetically shielded

However, due to many limitations in usability and construction, such as ventilation and air-conditioning facilities, this configuration is not very effective against changes in the magnetic field generated inside the shielded equipment

Also, since the whole equipment is magnetically shielded, the electron beam irradiation equipment is large and expensive

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