Silicon chip placing apparatus used for photo-etching machine pre-alignment system
A pre-alignment, lithography technology, applied in the direction of photolithography process exposure device, microlithography exposure equipment, etc., can solve the problems of silicon wafer placement, pre-alignment failure, precision difference, etc., to ensure repeatability, improve The effect of efficiency
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[0015] Aiming at the problems of low silicon wafer placement accuracy and poor precision repeatability when manually loading silicon wafers mentioned in the prior art, the present invention proposes a silicon wafer placement device for a lithography machine pre-alignment system, which can Imitate the process of manually loading silicon wafers to realize the steps of clamping, moving, and placing silicon wafers. Due to the use of mechanical control methods, errors caused by human factors can be effectively avoided.
[0016] The silicon wafer placing device includes a supporting mechanism, a silicon wafer clamping mechanism and a driving mechanism. The supporting mechanism is used to support the entire silicon wafer placement device and fix it in the pre-alignment system; the driving mechanism is used to drive the silicon wafer clamping mechanism to move horizontally or vertically to complete the movement of the silicon wafer and placement; the wafer clamping mechanism is connec...
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