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Cleaning member, delivery member with cleaning function, and method of cleaning substrate processing apparatus

A substrate processing device and a technology for cleaning components, which are applied in the directions of cleaning methods using tools, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as difficulty in sufficiently removing submicron-sized fine foreign objects and the like

Inactive Publication Date: 2009-08-05
NITTO DENKO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for this cleaning wafer, since the foreign matter is retained and removed by the voids of the dot pattern, only foreign matter having a particle diameter of about tens of microns can be removed, and it is difficult to sufficiently remove fine foreign matter of a submicron size.

Method used

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  • Cleaning member, delivery member with cleaning function, and method of cleaning substrate processing apparatus
  • Cleaning member, delivery member with cleaning function, and method of cleaning substrate processing apparatus

Examples

Experimental program
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Effect test

Embodiment 1～4

[0090] As catalyst metals, cobalt / molybdenum was dissolved in ethanol and coated on silicon wafers. Oxidation treatment is carried out at 250°C, so that the metal microparticles are uniformly formed on the silicon wafer. The ethanol was then heated to 700°C using an electric furnace to turn it into a vapor, forming multiwalled carbon nanotubes (MWCNTs) vertically oriented on the catalyst metal. In this way, cleaning members (1) to (4) having a layered member provided with a plurality of protrusions of a columnar structure as a carbon-based nanostructure on the surface were produced.

[0091] The multilayered carbon nanotube structures formed in the cleaning members (1) to (4) were observed with a scanning electron microscope (SEM). Table 1 shows the maximum diameter of the obtained multilayer carbon-based nanostructure and the length of the protruding part, and the density of the carbon-based nanostructure on the surface of the layered member. In addition, the dust removal p...

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PUM

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Abstract

A cleaning member that is free from staining at cleaning sites, being capable of simple and easy, unfailing, satisfactory removal of minute foreign matter, preferably foreign matter of submicron level; a delivery member with cleaning function including the cleaning member; and a method of cleaning a substrate processing apparatus with the use of the cleaning member or delivery member with cleaning function. There is provided a cleaning member comprising a layer member furnished on a major surface thereof with multiple protrusions of columnar structure, wherein the protrusions of columnar structure consist of a carbon nanostructure.

Description

technical field [0001] The present invention relates to a cleaning member for removing fine foreign substances, a conveying member with a cleaning function, and a cleaning method for a substrate processing apparatus using the cleaning member or the conveying member with a cleaning function. More specifically, the present invention relates to a cleaning member for removing fine foreign matter from a substrate or device from which fine foreign matter is to be avoided, such as semiconductors, flat panel displays, printed substrates, substrate processing equipment, etc., a conveying member with a cleaning function having the cleaning member, And a cleaning method of a substrate processing apparatus using the cleaning member or the conveying member with a cleaning function. Background technique [0002] In semiconductors, flat panel displays, printed circuit boards, and other manufacturing equipment and inspection equipment, various substrate processing equipment that avoids fore...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/304B08B1/00B08B1/20
CPCB08B1/00B08B7/0028C01B2202/08C01B2202/34C01B2202/36B82Y30/00B82Y40/00C01B32/16B08B1/10H01L21/304
Inventor 寺田好夫菅生悠树吉田良德前野洋平
Owner NITTO DENKO CORP
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