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Tools and method for manufacturing integrated circuit mask

A technology of integrated circuits and masks, which is applied in the field of manufacturing integrated circuit masks to achieve the effect of reducing manufacturing costs

Active Publication Date: 2009-09-16
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to overcome the defects of the existing method for manufacturing integrated circuit masks and provide a new method for manufacturing integrated circuit masks. The technical problem to be solved is to reduce the complexity of mask inspection and trimming steps degree to increase throughput and reduce manufacturing costs, ideal for practical

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  • Tools and method for manufacturing integrated circuit mask
  • Tools and method for manufacturing integrated circuit mask
  • Tools and method for manufacturing integrated circuit mask

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Embodiment Construction

[0072] In order to further explain the technical means and effects that the present invention takes to achieve the intended invention purpose, below in conjunction with the accompanying drawings and preferred embodiments, the specific implementation of the tool and method for manufacturing integrated circuit masks proposed according to the present invention , structure, method, step, feature and effect thereof, detailed description is as follows.

[0073] It is understood that the following disclosure provides many embodiments and illustrations of implementing different features of the invention. The illustration of components and arrangements described below is used to simplify the present invention. Of course, these illustrations are only for illustration and are not intended to limit the present invention. In addition, the present invention may reuse reference numerals and / or letter symbols in various instances. This repetition is for the purpose of brevity and clarity and...

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Abstract

The invention provides tools and method for manufacturing integrated circuit mask. The tools at least include a sensitivity module and a detecting unit. The sensitivity module is designed to assign a plurality of pattern features to different data types, and the detecting unit is designed to repair pattern features according to relavant sensitivity that is determined by at least a threshold value and pixel. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types. The embodiment of the invention applies different detecting standard and detecting repairing tools to different pattern features(such as main features, auxiliary features and pseudo features) so as to reduce manufacturing cost (detection cost and repair cost) and improve productivity.

Description

technical field [0001] The present invention relates to a tool and method for manufacturing masks, and more particularly to a tool and method for manufacturing integrated circuit masks. Background technique [0002] In semiconductor technology, a reticle (mask) is formed with a predesigned integrated circuit pattern. These masks are used in the lithographic manufacturing process to convert predesigned integrated circuit patterns into multiple semiconductor wafers. The pre-designed integrated circuit pattern formed on the mask is the main pattern. Any defects on the reticle will be transferred to these semiconductor wafers and cause yield problems. Therefore, the fabrication of the mask incorporates a high-precision manufacturing process. To ensure that each mask is produced with high-quality manufacturing techniques, further inspection and subsequent refurbishment steps are carried out. However, the various pattern features formed on the mask are designed for different f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F1/14
CPCG03F1/84
Inventor 涂志强黄健朝
Owner TAIWAN SEMICON MFG CO LTD
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