A laser marking method on wafer surface
Patent Information
- Authority / Receiving Office
- CN ยท China
- Current Assignee / Owner
- ZHEJIANG CRYSTAL OPTECH
- Publication Date
- 2009-09-16
- Estimated Expiration
- Not applicable ยท inactive patent
Abstract
Description
technical field
[0001] The invention relates to a marking method on the surface of an object by using a laser, in particular to a marking method on a wafer surface by using a laser. Background technique
[0002] On some glass sheets, such as the surface of wafers such as mobile phone or camera filter, sometimes they need to be marked. There are mainly two methods for marking on the wafer, one is to paste a paper mark on the surface of the wafer, and the other is to use a laser to ablate a three-dimensional mark on the surface of the wafer. Paper marks have been phased out due to their short service life and great impact on the light transmission effect of the chip; while the method of marking on the surface of the chip with a laser has basically the same life as the chip and is not easy to be damaged. be widely applied.
[0003] Under the existing technical conditions, when using a laser to mark the surface of a wafer, the required equipment is a laser marking machine and ...