Etching system using optical microscope

Abstract

The invention relates to an etching system using an optical microscope, in particular to an etching system using the optical microscope in a small-scale research activity using silicon substrate of unit size without the purpose of mass production. The optical microscope can form various selective patterns with low cost, whereas expansive photomask is not used.

Description

technical field [0001] The present invention relates to a photolithography system using an optical microscope, and more particularly, to a photolithography system using an optical microscope for small-scale research activities using a silicon substrate of a unit size not aimed at mass production. system, the optical microscope can form a variety of selective patterns at low cost without using expensive photomasks. Background technique [0002] In research and development of semiconductors such as next-generation electronic devices, photolithography (Photolithography) is necessary for metal vapor deposition or etching processes to produce desired patterns. [0003] Here, photolithography is one of the technologies necessary in the existing semiconductor process, and refers to thinly coating a photoresist, a chemical substance whose properties change in response to light of a specific wavelength, on a semiconductor substrate. A technique in which a desired portion is then sel...

AI Technical Summary

Problems solved by technology

[0006] However, existing lithography equipment is manufactured for the purpose of mass production, is expensive, and always requires a mask manufacturing process, so there is a problem that it is difficult to easily adopt it in the research stage.

[0007] In addition, there are also problems in that the masks necessary for the photolithography process are expensive, and the pattern of the already-made mask cannot be changed, and multiple masks are required to manufacture complex structures.

[0010] However, even in the case of using the above-mentioned etching equipment, it takes more time to manufacture the device than the existing lithography equipment, and the purchase or process costs are expensive, so there is a problem of low cost performance.

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