Flexible circuit plating surface whisker inhibition technology
A surface suppression and flexible circuit technology, applied in the field of whisker suppression on the surface of flexible circuit electroplating, can solve problems such as hidden dangers of fine line spacing circuits, lack of competitiveness of products, deterioration of solder wettability, etc., and achieve low cost and electroplating workability. Good effect of eliminating whisker growth
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0014] The pickling steps include: spraying in a 1% sulfuric acid solution tank at a temperature of 25° C. and a speed of 2 m / min; washing with clear water.
[0015] The mechanical brushing step is as follows: brushing is carried out on a 1000-mesh alumina brush roller with a transmission speed of 1.5 m / min and a rotating speed of 1200 rpm.
[0016] The aging treatment step is as follows: put the product in layers in an oven to ensure a uniform heating temperature, and then heat it for 120 minutes at a temperature of 145° C. to perform post-aging treatment.
Embodiment 2
[0018] The pickling steps include: spraying in a 2% sulfuric acid solution tank at a temperature of 35° C. and a speed of 2.5 m / min; washing with clear water.
[0019] The mechanical brushing step is as follows: brushing is carried out on a 1200-mesh alumina brush roller with a transmission speed of 2.0 m / min and a rotating speed of 1400 rpm.
[0020] The aging treatment step is as follows: put the product in layers in an oven to ensure uniform heating temperature, and heat for 150 minutes at a temperature of 155° C. to perform post-aging treatment.
[0021] In addition, the present invention requires the following key points for process control of electroplated tin-copper (Sn / Cu) alloy products:
[0022] 1) Quantitative analysis must be carried out on the ratio of copper ions precipitated from the electroplating layer. When the content of copper ions in the electrolyte increases, the content of copper ions in the plating layer also increases almost proportionally, and the al...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 