Method for adjusting characteristics of variable capacitance diode by using local secondary doping process
A varactor diode and secondary doping technology, applied in the manufacturing of electrical components, circuits, semiconductor/solid-state devices, etc., can solve the problem that the device characteristics cannot be optimized.
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[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0023] The method for adjusting the characteristics of a varactor diode by using a local secondary doping process provided by the present invention specifically includes the following steps:
[0024] Select the base-collector (B-C) junction of HBT material to make varactor diodes, and use the high doping characteristics of the base layer material in HBT to make the contact metal not go through a high-temperature metallization process or a rapid metallization process Ohmic contact can be formed;
[0025] Use high temperature resistance and multiple thickened mask layers to protect the areas that do not need secondary doping, use ion implantation equipment to perform secondary doping of doping elements on the varactor mater...
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