Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A heater, plate technology, applied in metal material coating process, semiconductor/solid-state device manufacturing, gaseous chemical plating, etc., can solve the influence of temperature uniformity, plasma distribution uniformity, heating performance and plate grounding performance. and other problems, to achieve the effect of small uniformity, stable mechanical structure and guaranteed flatness
Active Publication Date: 2011-08-17
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF0 Cites 0 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
[0008] like image 3 As shown, at a higher temperature and a larger size, the thermal expansion degree of the upper surface of the heating plate 2 is slightly higher than that of the lower surface, resulting in downward bending in the horizontal and vertical directions along the heating plate 2 plane, and the cumulative Finally, a more obvious downward curling phenomenon is produced on the four corners of the heater, so that the corners of the substrate above it are separated from the heating plate 2, causing its heating performance and plate grounding performance to be affected, thereby affecting temperature uniformity and Uniformity of plasma distribution
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
specific Embodiment 1
[0033] Specific embodiment one, such as Figure 4 , Figure 5 , Figure 6 Shown:
[0034] The flat panel heater comprises a main support 1 and a heating plate 2, and the heating plate 2 is in the shape of a square plate. The main support 1 is columnar, supported in the middle of the heating plate 2, and supports the heating plate 2 to maintain a level.
[0035] Auxiliary supports 3a, 3b, 3c, 3d are respectively provided between the main support 1 and the four corners of the heating plate 2, which are used to reinforce and assist the main support 1 to ensure the rigidity and stability of the entire structure.
[0036] Connectors 4a, 4b, 4c, 4d are respectively provided between the four corners of the heating plate 2 and the auxiliary supports 3a, 3b, 3c, 3d, for realizing the connection between the two. Meanwhile, the connectors 4a, 4b, 4c, The length of 4d is adjustable or optional, and an appropriate length can be selected according to the degree of thermal deformation of...
specific Embodiment 2
[0042] Specific embodiment two, such as Figure 7 As shown, there are eight auxiliary supports 3, which are respectively supported on the four corners and four sides of the heating plate 2. The structure of the auxiliary support 3 itself is not limited to columns, and other structural forms can be adopted according to the actual application, such as:
specific Embodiment 3
[0043] Specific embodiment three, such as Figure 8 As shown, the auxiliary support is in the form of a support plate 31, and four support plates 31 can be provided to be respectively supported between the four sides of the heating plate 2 and the main support 1;
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Login to view more
Abstract
The invention discloses a flat heater and plasma processing equipment. In the flat heater, an auxiliary support is arranged between a main support and the edge of a heating plate. The auxiliary support may be column-shaped four-corner support, column-shaped multipoint support, plate-shaped support, taper-shaped support, and pyramid-shaped support. Due to the auxiliary force and the reverse thermal expansion effect of the auxiliary support, the plane deformation of the heating plate is improved, the smoothness is maintained, the heating plate can be better contacted with a process substrate arranged above the heating plate, the heating property and the polar plate grounding property of the heating plate are better ensured, the mechanical structure is stable, and the uniformity of the process parameters is little affected; in addition, by adjusting the length of the auxiliary support, the operations of replacing and maintaining the auxiliary support are effectively saved, and the maintenance cost of main support parts is lowered. The flat heater is mainly applied to plasma enhanced chemical vapor deposition equipment or other plasma processing equipment.
Description
technical field [0001] The invention relates to plasma equipment, in particular to a flat heater and plasma processing equipment. Background technique [0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment is used to achieve thin film deposition on the substrate surface in the plasma processing process of polycrystalline silicon solar cell manufacturing and other semiconductor device manufacturing. Plasma energy increases the activity of reactive particles, and enables the process gas to achieve dissociation, reaction, deposition and other processes at a temperature of 300°C to 500°C. [0003] Such as figure 1 As shown, in the process chamber 5 of PECVD in the prior art, the substrate 6 is placed on the flat heater 7 in the process chamber 5, and the flat heater 7 serves as the lower electrode plate at the same time, and constitutes with the inlet uniform flow plate 8 The upper and lower electrode plates are fed with high-frequency or low-frequency energy, an...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to view more 
Login to view more