Method for preparing reflection reduction film with surface embedded type porous silicon structure of silicon base solar battery
A technology of solar cells and anti-reflection coatings, applied in chemical instruments and methods, circuits, electrical components, etc., can solve problems such as lack of crystal orientation
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[0023] The process and steps of this embodiment are as follows
[0024] For the device used in this embodiment, refer to the figure 1 . figure 1 It is a schematic diagram of the device for preparing antireflection film or low reflectivity film by electrochemical corrosion method. The device is a commonly used laboratory device.
[0025] (1) Select solar cell silicon substrate material, which is Czochralski monocrystalline silicon, P type, crystal orientation , thickness is 220 μm, unpolished; first place the silicon wafer as the solar cell silicon substrate material on Preliminary corrosion is carried out in the sodium hydroxide magnetic solution, to remove the mechanical damage layer on the surface of the silicon wafer; the preparation of the lye is that the volume ratio of sodium hydroxide and water is 1:5; the temperature of the lye is 80 ° C; The silicon wafer is placed in the alkali solution and corroded for 1 minute under the action of ultrasonic waves;
[0026] (2...
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