Semiconductor luminous device and packaging structure thereof
A light-emitting device and semiconductor technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as difficult heat dissipation and reduced wavelength conversion efficiency
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[0036] Figure 5 It is a cross-sectional view of a semiconductor light emitting device structure 100, and its fabrication procedure is as follows: Figure 1 to Figure 5 shown. figure 1 A light emitting diode is shown as an example, which includes a growth substrate 21 whose material can be gallium arsenide, silicon, silicon carbide, sapphire, indium phosphide, gallium phosphide, aluminum nitride or gallium nitride. Next, an epitaxial structure 22 is formed on the growth substrate 21 . The epitaxial structure 22 is formed by an epitaxial process, such as metal organic vapor deposition epitaxy (MOCVD), liquid phase epitaxy (LPE) or molecular beam epitaxy (MBE). The epitaxial structure 22 includes at least a first electrical type semiconductor layer 23, such as an n-type aluminum gallium indium phosphide (Al x Ga 1-x ) y In 1-y P layer or an n-type aluminum gallium indium nitride (Al x Ga 1-x ) y In 1-y N layer; an active layer 24, such as aluminum gallium indium phosp...
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