Method for preparing sapphire protective film on surface of platen glass
A technology of manuscript glass and sapphire, which is applied in the field of preparation of aluminum oxide protective film on the surface of manuscript glass, can solve the problems of low hardness, short service life and high cost of use of manuscript glass, and improve wear resistance and abrasion resistance Good, the effect of reducing work efficiency
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specific Embodiment approach 1
[0010] Specific Embodiment 1: The preparation method of the sapphire protective film on the surface of the platen glass in this embodiment is realized through the following steps: 1. Clean the platen glass with ultrasonic waves for 50-80 minutes, and then place the platen glass in a filter cathodic arc deposition device On the sample stage in the vacuum chamber; 2. Vacuum the vacuum chamber to 1.0×10 -6 ~9.9×10 -6 Argon gas is introduced after Torr, and the flow rate of argon gas is controlled to be 18-24cm 3 / min, when the pressure in the vacuum chamber reaches 8.0×10 -5 ~1.0×10 -4 During Torr, turn the sample stage to the ion cleaning position, perform ion cleaning on the platen glass surface for 10-20 minutes, then turn off the argon gas, and then turn the sample stage to the deposition position; 3. Continue to vacuumize the vacuum chamber, when the vacuum degrees up to 1.0 x 10 -6 ~9.9×10 -6 During Torr, the sample stage is heated to 400-1000°C, and then oxygen is int...
specific Embodiment approach 2
[0014] Specific embodiment 2: The difference between this embodiment and specific embodiment 1 is that the specific method of ultrasonic cleaning the platen glass in step 1 is: first, ultrasonically clean the platen glass with acetone for 20 minutes, and then ultrasonically clean the platen glass with anhydrous alcohol for 20 minutes , and finally ultrasonically cleaned with deionized water for 20 minutes. Other steps and parameters are the same as those in Embodiment 1.
[0015] In this embodiment, both acetone and absolute alcohol are commercially available products of analytical purity.
specific Embodiment approach 3
[0016] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is that in step two, the vacuum chamber is evacuated to 2.0×10 -6 ~6×10 -6 Argon gas was introduced after Torr. Other steps and parameters are the same as those in Embodiment 1 or Embodiment 2.
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