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Manufacturing method of SU-8 nano fluid system

A SU-8, nanofluid technology, applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of increasing process complexity and manufacturing cost, and nanoimprinting technology cannot process micro-nano composite structures at the same time. The method is simple and controllable, and the effect of low cycle

Inactive Publication Date: 2010-09-08
HEFEI UNIV OF TECH
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Problems solved by technology

However, nanofluidic systems include nanoscale channels and large sample cell structures. Nanoimprinting technology cannot process such micro-nano composite structures at the same time, and it is often necessary to combine conventional micron processing methods to fabricate such large sample cell structures. Size structure
This undoubtedly puts forward high requirements on the alignment process and precision, and at the same time increases the complexity of the process and the production cost

Method used

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  • Manufacturing method of SU-8 nano fluid system
  • Manufacturing method of SU-8 nano fluid system

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Embodiment Construction

[0028] The specific implementation is carried out according to the following process:

[0029] 1. Clean the quartz substrate, and spin-coat the photoresist used to make the grating mask on the quartz substrate, such as figure 1 Shown in middle A1; Utilize the holographic method to make the grating pattern of photoresist on the quartz substrate, as figure 1 Shown in A2; then transfer the grating pattern of the photoresist to the quartz substrate by reactive ion etching to form a quartz substrate with a grating pattern structure, which is spin-coated on the quartz substrate with the grating structure to make a sample cell mask photoresist, such as figure 1 Shown in A3 in the middle; Utilize the sample cell template to expose and develop the photoresist to form a photoresist pattern with a sample cell structure, such as figure 1 Shown in A4 among middle; Utilize reactive ion etching to transfer the photoresist pattern with the sample cell structure to the quartz substrate, and ...

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Abstract

The invention discloses a manufacturing method of an SU-8 nano fluid system, which is characterized by comprising the following steps of: manufacturing a photoetching-stamping combined template by utilizing a holographic exposure technology, applying the photoetching-stamping combined template to the processing of the SU-8 nano fluid system and realizing the manufacture of the nano fluid system by utilizing the different functions of different parts contained in the photoetching-stamping combined template and combining a bonding technology. The method has simple operation, realizes the synchronous molding of a sample pool and a nanochannel, has low manufacturing cost and does not need harsh equipment. Shown by the result of a fluid filling test for the manufactured nano fluid system, the system has no layering or blockage, the boundary of the channel is clear, the interface of bonding also can not be seen, and good quality is showed.

Description

technical field [0001] The invention relates to a method for manufacturing a SU-8 nanofluid system, more specifically to a method for manufacturing an SU-8 nanofluid system by using a photolithography-imprinting combination template, and belongs to the technical field of micro-nano fluid system manufacture. Background technique [0002] In recent years, the basic and technical application research related to nanofluidic systems has become an attractive frontier field. It is generally defined as the cross-section of the channel for fluid flow in the size range of hundreds to several nanometers. The fluid transport in it has specific properties, which can change many physicochemical properties that dominate the macroscopic and microscale fluid transport and molecular behavior. The research based on this system not only breaks through some important concepts of traditional theories, but also some in-depth research results have important applications in many fields such as stret...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00
Inventor 王旭迪李小军汤起升金建卢景景
Owner HEFEI UNIV OF TECH
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