N-doped crystalline silicon and preparation method thereof
A silicon nitride and polysilicon technology, applied in crystal growth, chemical instruments and methods, single crystal growth, etc., can solve the problems of single crystal growth process limitations, inability to guarantee single crystal silicon growth, nitrogen doping concentration limitations, etc., and achieve cost Low, easy to control, simple process effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
preparation example Construction
[0042] Based on the same reason as the preparation method of the above-mentioned polycrystalline silicon ingot, according to a preferred embodiment of the present invention, the amount of the above-mentioned silicon nitride nanopowder is preferably such that the nitrogen concentration in the master alloy silicon block is 20-100ppm amount.
[0043] According to one embodiment of the present invention, a nitrogen-doped polycrystalline silicon can be provided, which is prepared by the above-mentioned preparation method, wherein the polycrystalline silicon ingot contains 0.02-2ppm of electrically active dopants and 0.002-1ppm of nitrogen, the The electroactive dopant is any one of B, P, or Ga.
[0044] The present invention will be further described below through specific examples.
example 1
[0046] First, the mixture of polysilicon material and silicon nitride nano-powder with a particle size of 20nm is loaded in a quartz crucible, and the addition of the silicon nitride nano-powder is such that the nitrogen concentration in the master alloy silicon block is 100ppm . After that, install the furnace, vacuumize the furnace chamber and heat it to 1500°C. After it is completely melted, gradually reduce the temperature in the furnace to 1350°C at a cooling rate of 2°C / min, then turn off the heater and open the heat preservation cover to lower the temperature in the furnace chamber Naturally cool to room temperature, and then take out the silicon ingot and pulverize it into small blocks to obtain master alloy silicon blocks with high nitrogen content. When manufacturing master alloy silicon blocks, either single crystal furnaces or polycrystalline furnaces can be used, and the requirements for equipment are low.
[0047] Next, put the master alloy silicon block, polysi...
example 2
[0051] Put dislocation-free single crystal silicon in the bottom layer of the quartz crucible, and load the master alloy silicon block obtained in Example 1, polycrystalline silicon material and the mixture of B as an electrically active dopant on the upper layer and load it into a single crystal furnace , the furnace chamber is evacuated, while the crucible is heated, the bottom of the crucible is cooled by cold air until the temperature of the mixture part is 1480°C, at this temperature until the mixture is completely melted and the silicon monocrystalline The portion of the upper layer close to the mix melted. And because the cold air flows through the bottom of the crucible, the lower layer of monocrystalline silicon can be kept below the melting point of silicon, so that the monocrystalline silicon of a certain thickness in the lower layer remains as a seed crystal. Wherein, the amount of B added is such that the B doping concentration in the formed polycrystalline silico...
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com