Developing solution for panel display
A developer solution and compound technology, applied in the field of flat panel display, can solve the problems affecting the image display quality of flat panel display, reducing the yield rate of panel production lines, etc., and achieve the effects of improving developability, wide operating temperature range, and no residue
Active Publication Date: 2010-10-27
HEFEI MAOTENG ENVIRONMENTAL PROTECTION TECH CO LTD
View PDF7 Cites 3 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
If a high-precision photoresist image cannot be obtained, it will directly affect the display
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Example Embodiment
Example 1. Preparation of developer S1
The nonionic surfactant composed of 2.5 parts by weight of APG0800 and 2.5 parts by weight of APG1200 and 7.0 parts by weight of Na 2 CO 3 It is added to 88.0 parts by weight of water and stirred evenly at room temperature to obtain the developer S1 of the present invention. Wherein, the water used is deionized water, and the total metal ion concentration in the deionized water is 35 ng / L.
Example Embodiment
Example 2-18. Preparation of developer S2-S18
It was prepared in exactly the same way as in Example 1, except that the types and parts by weight of the nonionic surfactants and basic compounds were replaced as described in Table 1, and based on the nonionic surfactants and basic compounds used. The parts by weight and the total parts by weight of the nonionic surfactant, alkaline compound and water in each example are 100 parts. Determine the parts by weight of the deionized water used in each example, and obtain Table 1 respectively. The developer S2-S18.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses developing solution for panel display. The developing solution consists of a nonionic surfactant, an alkaline compound, and deionized water. The nonionic surfactant is at least two of the compounds shown in the structural general formula I. The alkaline compound is preferably at least one of sodium carbonate, sodium bicarbonate and potassium bicarbonate, and accounts for 1to 15 percent of the total weight of the developing solution, preferably 1 to 10 percent, more preferably 4 to 8 percent. The nonionic surfactant accounts for 1 to 15 percent of the total weight of the developing solution, preferably 1 to 10 percent, more preferably 5 to 9 percent. The balance is the deionized water. In the developing solution, the aqueous solution prepared from the sodium carbonate and the nonionic surfactant has good intersolubility; and the developing solution has the characteristics of good developing performance, no residue, wide range of the operation temperature, smallenvironmental pollution, and the like, and has wide application in the developing preparation technology for photosensitive resins.
Description
technical field The invention belongs to the field of flat panel display and relates to a developing solution for flat panel display. Background technique In the field of flat panel display, including plasma display (PDP), liquid crystal display (LCD) and organic electroluminescence (OLED) and other preparation processes, in order to obtain various fine images required, it is necessary to use photoresist (PhotoResistor) ) is coated on the substrate to form a thin film, then shielded with a photomask and exposed, and then developed with an alkaline developer to remove the unexposed part to obtain the desired image. Commonly used photoresists are alkali-soluble resins, such as phenolic resins, acrylic resins, and poly(p-hydroxystyrene), which are usually irradiated with ultraviolet light to change the molecular structure of the polymer resin and its solubility in alkali substances, so as to be able to Soluble in alkaline developer. Alkaline compounds used in alkaline develo...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): G03F7/32
Inventor 冯卫文
Owner HEFEI MAOTENG ENVIRONMENTAL PROTECTION TECH CO LTD