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Gas preprocessing method and device applied to analytical instruments

A gas pretreatment and analytical instrument technology, applied in the preparation of test samples, etc., can solve the problems of detection impact, frequent interruption, and heavy system maintenance workload, so as to reduce replacement costs, long service life, and reduce maintenance workload. Effect

Active Publication Date: 2012-03-28
FOCUSED PHOTONICS +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] 1) When the processing unit has not yet failed and can still process the sample gas, the backflush gas has been introduced, which will lead to frequent interruptions in the sample gas processing process, which in turn makes the intermittent gas analysis process more obvious. Not conducive to gas monitoring;
[0011] 2) The processing unit has failed, but the backflush gas has not yet been introduced, resulting in the sample gas entering the gas analyzer not meeting the standard, which has a great impact on subsequent detection
[0012] 3. Complex operation and heavy system maintenance workload
[0013] After the processing device completely fails, it is first necessary to stop the processing and analysis of the sample gas, and then replace the processing unit, which makes the operation complicated, the system maintenance workload is heavy, and full automation cannot be realized.

Method used

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  • Gas preprocessing method and device applied to analytical instruments
  • Gas preprocessing method and device applied to analytical instruments
  • Gas preprocessing method and device applied to analytical instruments

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] See figure 2 , A gas pretreatment device used in an analytical instrument for removing moisture in gas, the processing device includes an input port 1, a selection module 2, a processing module, an output port 4, a monitoring module 5, a judgment module 6 and Control module 7.

[0063] The processing module includes a first processing module and a second processing module. The first processing module includes an input end 311, a first processing unit, an output end 313, a first air inlet, and a first air outlet. The input end 311, the first processing unit and the output end 313 form a first processing channel, and the first air inlet, the first processing unit and the first exhaust port form a first regeneration channel. The first air inlet is shared with the output terminal 313, and the first air outlet is shared with the input terminal 311. The second processing module includes an input end 312, a second processing unit, an output end 314, a second air inlet, and a s...

Embodiment 2

[0080] See Figure 4 , A gas pretreatment device used in analytical instruments, the difference from embodiment 1 is:

[0081] 1. The input end 311 of the first processing channel is shared with the first air inlet, and the output end 313 is shared with the first air outlet; the input end 312 of the second processing channel is shared with the second air inlet, and the output end 314 is shared with the second air inlet. Two exhaust ports are shared;

[0082] 2. It also includes a switch module 32 for controlling the output end 313 (first exhaust port) and the input end 312 (second intake port), as well as the output end 314 (second exhaust port) and the input end 311 (first exhaust port). The air inlet) is on or off.

[0083] This embodiment also provides a gas pretreatment method applied to an analytical instrument. The difference from Embodiment 1 is:

[0084] In step c, the processed gas is discharged from the output port 313 or the output port 314, a part is output through the ou...

Embodiment 3

[0086] See Figure 5 , A gas pretreatment device used in analytical instruments to remove solid particles such as dust in the gas. The difference from Embodiment 1 is:

[0087] 1. It also includes a third processing channel, including an input end, a third processing unit, an output end, a third air inlet, and a third air outlet; wherein, the output end is shared with the third air inlet, and the input The end is shared with the third exhaust port; the third intake port communicates with the output ends on the first and second processing channels;

[0088] 2. Each processing unit uses filters to remove solid particles such as dust in the gas;

[0089] 3. The monitoring module uses a pressure sensor to determine whether the processing unit needs regeneration by measuring the pressure of the gas downstream of the processing channel.

[0090] This embodiment also provides a gas pretreatment method applied to an analytical instrument to remove solid particles such as dust in the gas. The ...

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Abstract

The invention relates to a gas preprocessing method applied to analytical instruments, which comprises the following steps of: a, providing at least two paths of processing channels; b, allowing gas to be processed to enter at least one path of processing channel for processing; c, introducing part of processed gas into the downstream of the processing channels, and introducing part of gas into at least one path of the processing channel which does not perform gas processing to make the processing channel become a regenerative processing channel; d, monitoring the processed gas; and e, according to a monitoring result and a set value, judging whether the processing channel through which the gas to be processed passes is needed to be adjusted or not, if so, adjusting the processing channelthrough which the gas to be processed passes, and returning to the step b, and otherwise, returning to the step d. The invention also provides a gas preprocessing device for implementing the method. The gas preprocessing method and the gas preprocessing device have the advantages of capability of performing gas processing continuously, long service life, little maintenance and the like.

Description

Technical field [0001] The invention relates to a gas pretreatment, in particular to a gas pretreatment method and device used in an analytical instrument. Background technique [0002] In the gas monitoring system, due to the complexity of the gas composition, other impurities will affect the measurement result when monitoring the specific gas composition. In order to provide clean and dry gas to the analyzer, the gas is generally pretreated before use or measurement. [0003] General sample gas has high dust, saturated moisture, easy to harden and rich in SO 2 , NO X , CO, H 2 S and other corrosion and crystallization gas characteristics, the sample gas temperature and pressure fluctuate greatly. Therefore, the pretreatment device is responsible for filtering the sample gas dust, adjusting the pressure, and keeping the temperature constant, and the processed sample gas can be provided to the analysis instrument for use. [0004] Existing gas pretreatment devices all use filter el...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N1/34G01N1/28
Inventor 叶显君黄伟宋旭东韦俊峥王健
Owner FOCUSED PHOTONICS
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