Two-side exposure device

An exposure device and surface exposure technology are applied in photolithography exposure devices, microlithography exposure equipment, optics, etc., which can solve the problems of reduced production capacity, time-consuming mask replacement, and difficulty in exposing multiple masks, so as to prevent Reduced productivity and reduced processing time

Active Publication Date: 2013-11-13
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] As described above, in the configuration in which the mask described in Patent Document 1 is switched and replaced, the mask can be replaced quickly, but it is difficult to perform exposure using a plurality of masks. Figure 9 As shown, in the structure of the library with masks, it is possible to replace a plurality of masks, but it takes time to replace the masks, and there is a problem that the productivity decreases.

Method used

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Examples

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Embodiment Construction

[0080] figure 1 It is a figure which shows the schematic structure of the double-sided exposure apparatus of the Example of this invention.

[0081] The double-side exposure apparatus of this embodiment is roughly divided into an exposure machine main body 10 , a workpiece loading and unloading unit 20 , an inversion table unit 30 , and a workpiece storage unit 40 .

[0082] In addition, the exposure machine main body 10 includes: a light irradiation unit 1 that emits exposure light; a mask stage 2 on which a mask M on which a pattern (mask pattern) such as a circuit formed on a workpiece is formed; A workpiece stage 4 for exposing the workpiece W; a projection lens 3 for projecting a mask pattern on the workpiece W on the workpiece stage 4; a mask library 6 for storing a plurality of masks; and the like.

[0083] In addition, the exposure machine main body 10 includes: a moving mechanism for the mask stage 2; a moving mechanism for the workpiece stage 4; an alignment micros...

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Abstract

The invention provides a two-side exposure device with a mask bank, capable of shortening the whole time required by the exposure process and preventing the production performance from being reduced. A workpiece (W) transported to a workpiece transportation part (20) is transported to a workpiece platform (4) and the pattern of the mask for exposing the first surface (front surface) from the mask bank (6) exposes the workpiece (W). The workpiece (W) is reversed (overturned) by a reverse platform part (30) and kept on a workpiece keeping part (40). Thus the first surface exposes all the workpieces of one batch and then the mask is replaced by the mask for exposing the second surface(back surface) and the workpiece with the exposed first surface is taken out from the workpiece keeping part (40) and the second surface (back surface) of the workpiece is exposed. The workpiece with exposed back surface is transported to the workpiece transportation part (20) by a first workpiece transportation mechanism (50b).

Description

technical field [0001] The present invention relates to a double-side exposure device for exposing both surfaces of a work (work) such as a printed board. Background technique [0002] In printed circuit boards and the like, there are cases where patterns such as circuits are formed on both sides of a workpiece. The exposure apparatus for this purpose is known as a "double-sided exposure apparatus". As an example thereof, there is a double-sided projection exposure apparatus described in Patent Document 1. [0003] The double-sided projection exposure apparatus described in this patent document includes: a light irradiation unit, an exposure stage, a first mask and a second mask, a mask stage holding the two masks, a projection lens, and an inversion stage for inverting a workpiece. Wait. [0004] In this exposure apparatus, after exposing the first surface (front surface) of the workpiece using the first mask, the workpiece is inverted by the inversion stage, and the sec...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2022G03F7/2032H01L21/0274H01L21/0337
Inventor 佐藤善彦友永竹彦
Owner USHIO DENKI KK
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